Invention Grant
- Patent Title: Reducing hot electron injection type of read disturb in 3D non-volatile memory for edge word lines
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Application No.: US15208843Application Date: 2016-07-13
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Publication No.: US09905305B2Publication Date: 2018-02-27
- Inventor: Hong-Yan Chen , Yingda Dong
- Applicant: SanDisk Technologies LLC
- Applicant Address: US TX Plano
- Assignee: SanDisk Technologies LLC
- Current Assignee: SanDisk Technologies LLC
- Current Assignee Address: US TX Plano
- Agency: Vierra Magen Marcus LLP
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/34 ; G11C16/26 ; G11C11/56 ; G11C16/08 ; G11C16/32 ; G11C11/04

Abstract:
Read disturb due to hot electron injection is reduced in a 3D memory device by controlling the magnitude and timing of word line and select gate ramp down voltages at the end of a sensing operation. In an example read operation, a predefined subset of word lines includes source-side and drain-side word lines. For the predefined subset of word lines, word line voltages are ramped down before the voltages of the select gates are ramped down. Subsequently, for a remaining subset of word lines, word line voltages are ramped down, but no later than the ramping down of the voltages of the select gates. The timing of the ramp down of the selected word line depends on whether it is among the predefined subset or the remaining subset. The predefined subset can include a number of adjacent or non-adjacent word lines.
Public/Granted literature
- US20160358662A1 Reducing Hot Electron Injection Type Of Read Disturb In 3D Non-Volatile Memory For Edge Word Lines Public/Granted day:2016-12-08
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