Invention Grant
- Patent Title: Photomask including monitoring marks
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Application No.: US15074106Application Date: 2016-03-18
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Publication No.: US09915865B2Publication Date: 2018-03-13
- Inventor: Su In Kim , Yong Hoon Kim
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: KR10-2015-0101694 20150717
- Main IPC: G03F1/44
- IPC: G03F1/44

Abstract:
A photomask including monitoring marks is disclosed. In one aspect, the photomask includes a transparent substrate, a mask pattern formed on an upper surface of the transparent substrate, and a monitoring mark having a line width pattern shared with the mask pattern. The monitoring mark is configured to receive a laser beam so as to measure a power state of the laser beam.
Public/Granted literature
- US20170017149A1 PHOTOMASK INCLUDING MONITORING MARKS Public/Granted day:2017-01-19
Information query