公开(公告)号：US11422421B2

公开(公告)日：2022-08-23

申请号：US16785554

申请日：2020-02-07

Applicant: Samsung Display Co., Ltd.

Inventor： Young Jae Jeon ,  Shin Tack Kang ,  Su In Kim ,  Ju Yong Park ,  Gi Jung Lee ,  Sol Ip Jeong

IPC: G02F1/1362 ,  H01L27/12

Abstract: A liquid crystal display includes a gate line; a data line crossing the gate line; a first voltage line spaced apart from the gate line; a second voltage line, a first transistor including a first gate electrode connected to the gate line, a first source electrode connected to the data line, and a first drain electrode; a second transistor including a second gate electrode connected to the gate line, a second source electrode connected to the data line, and a second drain electrode; a third transistor including a third gate electrode connected to the first voltage line, a third source electrode connected to the second drain electrode, and a third drain electrode connected to the second voltage line; a first liquid crystal capacitor connected to the first drain electrode of the first transistor; and a second liquid crystal capacitor connected to the second drain electrode of the second transistor.

公开(公告)号：US09915865B2

公开(公告)日：2018-03-13

申请号：US15074106

申请日：2016-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Su In Kim ,  Yong Hoon Kim

IPC: G03F1/44

CPC classification number: G03F1/44

Abstract: A photomask including monitoring marks is disclosed. In one aspect, the photomask includes a transparent substrate, a mask pattern formed on an upper surface of the transparent substrate, and a monitoring mark having a line width pattern shared with the mask pattern. The monitoring mark is configured to receive a laser beam so as to measure a power state of the laser beam.

公开(公告)号：US20170017149A1

公开(公告)日：2017-01-19

申请号：US15074106

申请日：2016-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Su In Kim ,  Yong Hoon Kim

IPC: G03F1/44 ,  G03F1/60

CPC classification number: G03F1/44

Abstract: A photomask including monitoring marks is disclosed. In one aspect, the photomask includes a transparent substrate, a mask pattern formed on an upper surface of the transparent substrate, and a monitoring mark having a line width pattern shared with the mask pattern. The monitoring mark is configured to receive a laser beam so as to measure a power state of the laser beam.

Abstract translation: 公开了包括监视标记的光掩模。 一方面，光掩模包括透明基板，形成在透明基板的上表面上的掩模图案，以及具有与掩模图案共享的线宽图案的监视标记。 监视标记被配置为接收激光束以便测量激光束的功率状态。