公开(公告)号：US20170017149A1

公开(公告)日：2017-01-19

申请号：US15074106

申请日：2016-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Su In Kim ,  Yong Hoon Kim

IPC: G03F1/44 ,  G03F1/60

CPC classification number: G03F1/44

Abstract: A photomask including monitoring marks is disclosed. In one aspect, the photomask includes a transparent substrate, a mask pattern formed on an upper surface of the transparent substrate, and a monitoring mark having a line width pattern shared with the mask pattern. The monitoring mark is configured to receive a laser beam so as to measure a power state of the laser beam.

Abstract translation: 公开了包括监视标记的光掩模。 一方面，光掩模包括透明基板，形成在透明基板的上表面上的掩模图案，以及具有与掩模图案共享的线宽图案的监视标记。 监视标记被配置为接收激光束以便测量激光束的功率状态。

公开(公告)号：US09915865B2

公开(公告)日：2018-03-13

申请号：US15074106

申请日：2016-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Su In Kim ,  Yong Hoon Kim

IPC: G03F1/44

CPC classification number: G03F1/44

Abstract: A photomask including monitoring marks is disclosed. In one aspect, the photomask includes a transparent substrate, a mask pattern formed on an upper surface of the transparent substrate, and a monitoring mark having a line width pattern shared with the mask pattern. The monitoring mark is configured to receive a laser beam so as to measure a power state of the laser beam.