- 专利标题: Methods for using atomic layer deposition to produce a film for solid state electrolytes and protective electrode coatings for lithium batteries
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申请号: US14711504申请日: 2015-05-13
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公开(公告)号: US09917295B2公开(公告)日: 2018-03-13
- 发明人: Jeffrey W. Elam , Xiangbo Meng
- 申请人: UChicago Argonne, LLC
- 申请人地址: US IL Chicago
- 专利权人: UChicago Argonne, LLC
- 当前专利权人: UChicago Argonne, LLC
- 当前专利权人地址: US IL Chicago
- 代理机构: Foley & Lardner LLP
- 主分类号: H01M4/04
- IPC分类号: H01M4/04 ; H01M10/058 ; H01M10/0562 ; H01M4/58 ; H01M4/136 ; H01M4/1397 ; H01M10/0525 ; H01M10/052
摘要:
A method for using atomic layer deposition to produce a film configured for use in an anode, cathode, or solid state electrolyte of a lithium-ion battery or a lithium-sulfur battery. The method includes repeating a cycle for a predetermined number of times in an inert atmosphere. The cycle includes exposing a substrate to a first precursor, purging the substrate with inert gas, exposing the substrate to a second precursor, and purging the substrate with inert gas. The film is a metal sulfide.
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