Invention Grant
- Patent Title: Cleaning composition and cleaning method
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Application No.: US14714526Application Date: 2015-05-18
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Publication No.: US09920287B2Publication Date: 2018-03-20
- Inventor: Takahiro Hayama , Megumi Arakawa , Yuki Kushida , Kiyotaka Mitsumoto , Yasutaka Kamei , Masahiro Noda , Tatsuya Yamanaka
- Applicant: JSR Corporation
- Applicant Address: JP Minato-ku
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-104764 20140520; JP2015-046737 20150310
- Main IPC: C11D7/32
- IPC: C11D7/32 ; C11D11/00 ; C11D3/36 ; C11D3/34 ; C11D3/20 ; C11D3/30 ; C11D3/33 ; C11D3/37 ; C11D1/37 ; C11D7/26 ; C11D7/34 ; C11D7/36 ; C11D1/14

Abstract:
A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof, (B) an organic acid, (C) a water-soluble amine, (D) a water-soluble polymer, and an aqueous medium, the cleaning composition having a pH of 9 or more.
Public/Granted literature
- US20150337245A1 CLEANING COMPOSITION AND CLEANING METHOD Public/Granted day:2015-11-26
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