公开(公告)号：US09920287B2

公开(公告)日：2018-03-20

申请号：US14714526

申请日：2015-05-18

Applicant: JSR Corporation

Inventor： Takahiro Hayama ,  Megumi Arakawa ,  Yuki Kushida ,  Kiyotaka Mitsumoto ,  Yasutaka Kamei ,  Masahiro Noda ,  Tatsuya Yamanaka

IPC: C11D7/32 ,  C11D11/00 ,  C11D3/36 ,  C11D3/34 ,  C11D3/20 ,  C11D3/30 ,  C11D3/33 ,  C11D3/37 ,  C11D1/37 ,  C11D7/26 ,  C11D7/34 ,  C11D7/36 ,  C11D1/14

CPC classification number: C11D11/0047 ,  C11D1/146 ,  C11D1/37 ,  C11D3/2075 ,  C11D3/2082 ,  C11D3/30 ,  C11D3/33 ,  C11D3/3409 ,  C11D3/36 ,  C11D3/361 ,  C11D3/3707 ,  C11D3/3757 ,  C11D7/265 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/34 ,  C11D7/36

Abstract: A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof, (B) an organic acid, (C) a water-soluble amine, (D) a water-soluble polymer, and an aqueous medium, the cleaning composition having a pH of 9 or more.