Invention Grant
- Patent Title: Tungsten films by organometallic or silane pre-treatment of substrate
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Application No.: US15151612Application Date: 2016-05-11
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Publication No.: US09922872B2Publication Date: 2018-03-20
- Inventor: David Knapp , Jeffrey W. Anthis , Xinyu Fu , Srinivas Gandikota
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L23/498 ; H01L23/532 ; H01L21/285
Abstract:
Processing methods comprising exposing a substrate to a nucleation promoter followed by sequential exposure of a first reactive gas comprising a metal-containing compound and a second reactive gas to form a metal-containing film on the substrate.
Public/Granted literature
- US20160336222A1 Tungsten Films by Organometallic or Silane Pre-Treatment of Substrate Public/Granted day:2016-11-17
Information query
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