Invention Grant
- Patent Title: Through wiring substrate
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Application No.: US15581606Application Date: 2017-04-28
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Publication No.: US09930779B2Publication Date: 2018-03-27
- Inventor: Kenichi Yoshida , Tatsuya Harada
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2016-090815 20160428
- Main IPC: H05K1/09
- IPC: H05K1/09 ; H05K1/11 ; H05K3/42 ; H05K3/16

Abstract:
A through wiring substrate comprises a substrate having a pair of principal surfaces and a through hole penetrating between the pair of principal surfaces, the pair of principal surfaces and an inner surface of the through hole being electrically insulative; a through electrode provided on the inner surface of the through hole; a first wiring layer provided on one of the principal surfaces and connected to the through electrode; a second wiring layer provided on the other of the principal surfaces and connected to the through electrode; an underlying metal layer provided between the one of the principal surfaces and the first wiring layer; and catalyst metal particles existing between the underlying metal layer and the first wiring layer and between the through electrode and the inner surface of the through hole.
Public/Granted literature
- US20170318675A1 THROUGH WIRING SUBSTRATE Public/Granted day:2017-11-02
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