- 专利标题: Photosensitive resin composition for color filter and application of the same
-
申请号: US15147913申请日: 2016-05-06
-
公开(公告)号: US09939568B2公开(公告)日: 2018-04-10
- 发明人: Jung-Pin Hsu , Bo-Hsuan Lin
- 申请人: Chi Mei Corporation
- 申请人地址: TW Tainan
- 专利权人: Chi Mei Corporation
- 当前专利权人: Chi Mei Corporation
- 当前专利权人地址: TW Tainan
- 代理机构: JCIPRNET
- 优先权: TW104114414A 20150506
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; G02B5/22 ; G03F7/00 ; G02F1/1335 ; G03F7/031 ; G03F7/032 ; G03F7/033 ; G03F7/038
摘要:
The present invention relates to a photosensitive resin composition for a color filter and an application of the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D) and a pigment (E). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having the structure represented by formula (1). The aforementioned photosensitive resin composition is advantageously applied for the color filer with better contrast.
公开/授权文献
信息查询
IPC分类: