Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US15116794Application Date: 2015-01-20
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Publication No.: US09939740B2Publication Date: 2018-04-10
- Inventor: Günes Nakiboglu , Martijn Van Baren , Frank Johannes Jacobus Van Boxtel , Koen Cuypers , Jeroen Gerard Gosen , Laurentius Johannes Adrianus Van Bokhoven
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: WOPCT/EP2014/053372 20140220; EP14166771 20140501; EP14188390 20141010
- International Application: PCT/EP2015/050936 WO 20150120
- International Announcement: WO2015/124344 WO 20150827
- Main IPC: B60R1/06
- IPC: B60R1/06 ; G03B27/52 ; G03B27/58 ; G03B27/62 ; H02K41/02 ; G03F7/20

Abstract:
A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.
Public/Granted literature
- US20160349631A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2016-12-01
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