Invention Grant
- Patent Title: Semiconductor device with surface integrated focusing element and method of producing a semiconductor device with focusing element
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Application No.: US15119377Application Date: 2015-02-10
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Publication No.: US09947711B2Publication Date: 2018-04-17
- Inventor: Rainer Minixhofer , Martin Schrems , Sara Carniello
- Applicant: ams AG
- Applicant Address: AT Unterpremstaetten
- Assignee: AMS AG
- Current Assignee: AMS AG
- Current Assignee Address: AT Unterpremstaetten
- Agency: McDermott Will & Emery LLP
- Priority: EP14155574 20140218
- International Application: PCT/EP2015/052765 WO 20150210
- International Announcement: WO2015/124465 WO 20150827
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L31/0203 ; H01L31/02 ; H01L27/32

Abstract:
The semiconductor device comprises a semiconductor substrate (1), a sensor or sensor array (2) arranged at a main surface (10) of the substrate, an integrated circuit (3) arranged at or above the main surface, and a focusing element (17) comprising recesses (4) formed within a further main surface (11) of the substrate opposite the main surface. The focusing element may be arranged opposite the sensor or sensor array (2), which may be a photosensor or photodetector or an array of photosensors or photodetectors, for instance. The focusing element (17) is formed by etching the recesses (4) into the semiconductor material.
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Information query
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