发明授权
- 专利标题: Multilayer structure having at least one metal layer and at least one polyamide layer
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申请号: US14945684申请日: 2015-11-19
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公开(公告)号: US09950499B2公开(公告)日: 2018-04-24
- 发明人: Georg Stoppelmann , Gabriel Garcia
- 申请人: EMS-PATENT AG
- 申请人地址: CH Domat/Ems
- 专利权人: EMS-PATENT AG
- 当前专利权人: EMS-PATENT AG
- 当前专利权人地址: CH Domat/Ems
- 代理机构: Sughrue Mion, PLLC
- 优先权: EP14197318 20141211
- 主分类号: B32B15/088
- IPC分类号: B32B15/088 ; B32B15/085 ; C09D123/08 ; B32B15/20 ; C09D177/06 ; C08L77/06 ; C09D151/06 ; H01B3/30 ; C08K5/00
摘要:
A layer structure having at least one metal element and at least one polyamide layer arranged at least regionally on the metal element, the structure preferably comprising an insulated electrical conductor wherein The polyamide layer consists of a polyamide molding composition consisting of the following components: (a) a polyamide based on cycloaliphatic diamines or cycloaliphatic dicarboxylic acids having a glass transition temperature (Tg) of at 130° C.; (b) a polyolefin based on C2-C12 alkenes, and additionally on at least one monomer selected from the following group: maleic anhydride, itaconic anhydride, glycidyl acrylate, butene, propylene, glycidyl methacrylate, acrylic acid, methacrylic acid, vinyl acetate, C1-C12 alkyl (meth)acrylates, substituted or unsubstituted styrene, or a mixture of such monomers; (c) optionally an aliphatic polyamide different from (a), or a mixture of such polyamides; (d) optionally additives.
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