Invention Grant
- Patent Title: Liquid processing aparatus
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Application No.: US14525541Application Date: 2014-10-28
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Publication No.: US09953852B2Publication Date: 2018-04-24
- Inventor: Jiro Higashijima , Yuichi Douki , Masami Akimoto , Shigehisa Inoue
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2013-225380 20131030
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B1/04

Abstract:
A liquid processing apparatus of the present disclosure performs a liquid processing by supplying a processing liquid to a substrate that is rotating. A substrate holding unit configured to be rotatable around a vertical axis is provided with a holding surface to attract and hold a bottom surface of the substrate horizontally. A guide unit is formed integrally with the substrate holding unit, disposed around the substrate held in the substrate holding unit, and provided at a position equal to or lower than a height of a top surface of a periphery of the substrate. The guide unit includes a guide surface configured to guide the processing liquid. A rotary cup rotates integrally with the substrate holding unit, and guides the processing liquid towards the cup between the rotary cup and the guide unit.
Public/Granted literature
- US20150114561A1 LIQUID PROCESSING APPARATUS Public/Granted day:2015-04-30
Information query
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