Invention Grant
- Patent Title: Apparatus and method for dual mode depth measurement
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Application No.: US14977628Application Date: 2015-12-21
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Publication No.: US09958267B2Publication Date: 2018-05-01
- Inventor: Ludovic Angot , Kun-Lung Tseng , Yi-Heng Chou
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Rabin & Berdo, P.C.
- Main IPC: G01C3/08
- IPC: G01C3/08 ; G06T7/571 ; H04N5/232

Abstract:
An apparatus and a method for dual mode depth measurement are provided. The apparatus is used for measuring a depth information of a specular surface in a depth from defocus (DFD) mode or measuring a depth information of a textured surface in a depth from focus (DFF) mode. The apparatus includes a light source, a controller, a processor, a lighting optical system, an imaging optical system, a beam splitter and a camera. The controller is for switching between the depth from defocus mode and the depth from focus mode. The lighting optical system is used to focus a light from the light source on an object surface in the depth from defocus mode, and the lighting optical system is used to illuminate the object surface with a uniform irradiance in the depth from focus mode.
Public/Granted literature
- US20170178334A1 APPARATUS AND METHOD FOR DUAL MODE DEPTH MEASUREMENT Public/Granted day:2017-06-22
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