Invention Grant
- Patent Title: Signal enhancement mechanism for dual-gate ion sensitive field effect transistor in on-chip disease diagnostic platform
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Application No.: US15581673Application Date: 2017-04-28
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Publication No.: US09958443B2Publication Date: 2018-05-01
- Inventor: Ching-Hui Lin , Chun-Ren Cheng , Shih-Fen Huang , Yi-Hsien Chang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L51/05
- IPC: H01L51/05 ; G01N27/414 ; G01N33/543 ; H01L29/78 ; C12Q1/00 ; H01L51/00 ; H01L29/66

Abstract:
Dual-gate ion-sensitive field effect transistors (ISFETs) for disease diagnostics are disclosed herein. An exemplary dual-gate ISFET includes a gate structure and a fluidic gate structure disposed over opposite surfaces of a device substrate. The gate structure is disposed over a channel region defined between a source region and a drain region in the device substrate. The fluidic gate structure includes a sensing well that is disposed over the channel region. The sensing well includes a sensing layer and an electrolyte solution. The electrolyte solution includes a constituent that can react with a product of an enzymatic reaction that occurs when an enzyme-modified detection mechanism detects an analyte. The sensing layer can react with a first ion generated from the enzymatic reaction and a second ion generated from a reaction between the product of the enzymatic reaction and the constituent, such that the dual-gate ISFET generates an enhanced electrical signal.
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