Invention Grant
- Patent Title: Systems and methods for controlling EUV energy generation using pulse intensity
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Application No.: US14824289Application Date: 2015-08-12
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Publication No.: US09980359B2Publication Date: 2018-05-22
- Inventor: Daniel Jason Riggs , Robert Jay Rafac
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Main IPC: H05G1/30
- IPC: H05G1/30 ; H05G2/00

Abstract:
In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a plasma created from droplets irradiated by a laser pulse can become destabilized. The instability of the plasma can reduce the amount of EUV energy generated over time. While other systems seek to stabilize the plasma by varying a pulse width of the laser pulses, the systems and methods described herein stabilize the plasma by varying an intensity of the laser pulses. The intensity of the laser pulses is varied based on a comparison of the amount of EUV energy generated from current pulse to an expected amount of EUV energy. The intensity of the laser pulses can be varied on a pulse-by-pulse basis by an EUV controller that instructs a pulse actuator.
Public/Granted literature
- US20170048960A1 SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PULSE INTENSITY Public/Granted day:2017-02-16
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