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公开(公告)号：US20230300965A1
公开(公告)日：2023-09-21
申请号：US18016553
申请日：2021-07-23
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac
IPC: H05G2/00
Abstract: Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target’s shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous distribution of a propagation mode such as a polarization mode across a spatial mode of the target.
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2.发明公开公开(公告)号：US20230164900A1
公开(公告)日：2023-05-25
申请号：US18011593
申请日：2021-06-21
Applicant: ASML Netherlands B.V.
Inventor： Alexander Igorevich Ershov , Chirag Rajyaguru , Dietmar Uwe Herbert Trees , Joshua Mark Lukens , Theodorus Wilhelmus Driessen , Robert Jay Rafac , Georgiy Olegovich Vaschenko
IPC: H05G2/00
CPC classification number: H05G2/006 , H05G2/008 , G03F7/70033
Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle in a stream that breaks up into droplets that then undergo coalescence. The droplets are then subjected to a stream of gas that entrains and accelerates the droplets.
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公开(公告)号：US20210263422A1
公开(公告)日：2021-08-26
申请号：US17277027
申请日：2019-08-12
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.
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公开(公告)号：US10904993B2
公开(公告)日：2021-01-26
申请号：US16418652
申请日：2019-05-21
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , John Tom Stewart , Andrew David LaForge
IPC: H05G2/00
Abstract: A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.
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公开(公告)号：US10674591B2
公开(公告)日：2020-06-02
申请号：US16391890
申请日：2019-04-23
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
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Patent Agency Ranking
公开(公告)号：US20170311429A1
公开(公告)日：2017-10-26
申请号：US15137933
申请日：2016-04-25
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , John Tom Stewart , Andrew David LaForge
IPC: H05G2/00
Abstract: A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.
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公开(公告)号：US08866110B2
公开(公告)日：2014-10-21
申请号：US14199261
申请日：2014-03-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert Jay Rafac , Igor V. Fomenkov , Daniel J. W. Brown
IPC: H05G2/00
Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.
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公开(公告)号：US12238848B2
公开(公告)日：2025-02-25
申请号：US18016553
申请日：2021-07-23
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac
IPC: H05G2/00
Abstract: Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target's shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous distribution of a propagation mode such as a polarization mode across a spatial mode of the target.
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公开(公告)号：US11758639B2
公开(公告)日：2023-09-12
申请号：US17416636
申请日：2020-01-27
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac
CPC classification number: H05G2/008 , G01N21/6402 , H05G2/006
Abstract: An apparatus includes: a diagnostic system configured to diagnostically interact with a current target (110c) traveling along a trajectory (TR) and before the current target enters a target space; a first detection apparatus (120) configured to detect first light; a second detection apparatus (130) configured to detect second light; and a control system (150) in communication with the first and second detection apparatuses. The first light includes: light (140) produced from an interaction between the current target and the diagnostic system, and light (142) emitted from a plasma produced by a previous target. The second light includes the light (142) emitted from the plasma produced by the previous target. The control system (150) is configured to: produce an analysis signal based on first and second signals produced from respective outputs of the first and second detection apparatuses; and estimate a property of the current target based on the produced analysis signal.
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公开(公告)号：US20220192000A1
公开(公告)日：2022-06-16
申请号：US17433007
申请日：2020-03-02
Applicant: ASML Netherlands B.V.
Inventor： Igor Vladimirovich Fomenkov , Yezheng Tao , Robert Jay Rafac
Abstract: Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source material is at a first position and the second pulse is directed towards the source material when the source material is at a second position.
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