-
公开(公告)号：US10674591B2
公开(公告)日：2020-06-02
申请号：US16391890
申请日：2019-04-23
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
-
公开(公告)号：US20230018949A1
公开(公告)日：2023-01-19
申请号：US17782268
申请日：2020-12-11
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Liane Manuela Matthes , Rilpho Ludovicus Donker , Martinus Hendrikus Antonius Leenders
Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.
-
3.发明授权Systems and methods to avoid instability conditions in a source plasma chamber 有权避免源等离子体室内不稳定条件的系统和方法公开(公告)号：US09536631B1
公开(公告)日：2017-01-03
申请号：US14946668
申请日：2015-11-19
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs
Abstract: In LPP EUV systems, sinusoidal oscillations or instabilities can occur in the generated EUV energy. This is avoided by detecting when the LPP EUV system is approaching such instability and adjusting the LPP EUV system by moving the laser beam of the LPP EUV system. Detection is done by determining when the generated EUV energy is at or above a primary threshold. Adjusting the LPP EUV system by moving the laser beam is done for a fixed period of time, until a subsequently generated EUV energy is below the primary threshold, until a subsequently generated EUV energy is below the primary threshold for a fixed period of time, or until a subsequently generated EUV energy is at or below a secondary threshold below the primary threshold.
Abstract translation: 在LPP EUV系统中，正弦波振荡或不稳定性可能发生在产生的EUV能量中。 通过检测LPP EUV系统何时接近这种不稳定性并通过移动LPP EUV系统的激光束来调整LPP EUV系统来避免这种情况。 通过确定何时生成的EUV能量处于或高于主阈值来进行检测。 通过移动激光束来调节LPP EUV系统一段固定的时间，直到随后产生的EUV能量低于初级阈值，直到随后产生的EUV能量低于主要阈值达固定时间段，或 直到随后产生的EUV能量处于或低于低于主阈值的次级阈值。
-
公开(公告)号：US20240361222A1
公开(公告)日：2024-10-31
申请号：US18576266
申请日：2022-06-24
Applicant: ASML Netherlands B.V.
Inventor： Dustin Michael Urone , Theodorus Wilhelmus Driessen , Daniel Jason Riggs , Rodney D. Simmons , Jaden Robert Bankhead , Paul Alexander McKenzie
IPC: G01N15/0205 , H05G2/00
CPC classification number: G01N15/0211 , H05G2/008
Abstract: Disclosed is an apparatus for and method of detecting a droplet of target material in a system for generating EUV radiation in which an illumination system is used to illuminate the droplet of a target material and a detector is arranged to detect radiation from the illumination system that has been forward or side scattered by the droplet of target material.
-
公开(公告)号：US09980359B2
公开(公告)日：2018-05-22
申请号：US14824289
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a plasma created from droplets irradiated by a laser pulse can become destabilized. The instability of the plasma can reduce the amount of EUV energy generated over time. While other systems seek to stabilize the plasma by varying a pulse width of the laser pulses, the systems and methods described herein stabilize the plasma by varying an intensity of the laser pulses. The intensity of the laser pulses is varied based on a comparison of the amount of EUV energy generated from current pulse to an expected amount of EUV energy. The intensity of the laser pulses can be varied on a pulse-by-pulse basis by an EUV controller that instructs a pulse actuator.
-
Patent Agency Ranking
6.发明授权公开(公告)号：US09832854B2
公开(公告)日：2017-11-28
申请号：US14824280
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a droplet is irradiated by a laser pulse to produce a plasma in a chamber. This generates forces that cause the plasma to destabilize and subsequent droplets to have their flight trajectory and speed altered as they approach the plasma. This destabilization is detectable from oscillations in the amount of EUV energy generated. To reduce the oscillations by stabilizing the plasma and travel of the droplets, a proportional-integral (PI) controller algorithm is used to modify an energy of subsequent laser pulses based on the EUV energy generated in the chamber. By modifying the energy of subsequent laser pulses, the plasma stabilizes, which reduces effects on droplet flight and stabilizes the amount of EUV energy generated, allowing the plasma chamber to operate for longer intervals and to lower the amount of reserve power maintained by a laser source.
-
公开(公告)号：US09820368B2
公开(公告)日：2017-11-14
申请号：US14824141
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
CPC classification number: H05G2/008
Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
-
8.发明授权公开(公告)号：US09755396B1
公开(公告)日：2017-09-05
申请号：US15363570
申请日：2016-11-29
Applicant: ASML Netherlands B.V.
Inventor： Paul Frihauf , Andrew Liu , Spencer Rich , Matthew R. Graham , Steven Chang , Wayne J. Dunstan , Daniel Jason Riggs
CPC classification number: H01S3/102 , H01S3/005 , H01S3/10038 , H01S3/1068 , H01S3/107 , H01S3/2232 , H05G2/003 , H05G2/008
Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source that combines pulse control mode and pulse modulation. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. If the desired pulse energy for the next droplet is within the range of one or more pulse modulation actuators, the pulse is modulated; otherwise, the pulse is fired to miss the droplet. This provides greater control of the accumulated dose as well as uniformity of the EUV energy over time, greater ability to compensate for pulses that generate EUV energy that is higher or lower than nominal expected values, and ability to provide an average EUV energy per pulse that is less than the nominal minimum EUV energy per pulse of the system.
-
9.发明申请SYSTEMS AND METHODS FOR STABILIZATION OF DROPLET-PLASMA INTERACTION VIA LASER ENERGY MODULATION 有权通过激光能量调节来抑制水平 - 等离子体相互作用的系统和方法公开(公告)号：US20170048959A1
公开(公告)日：2017-02-16
申请号：US14824280
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a droplet is irradiated by a laser pulse to produce a plasma in a chamber. This generates forces that cause the plasma to destabilize and subsequent droplets to have their flight trajectory and speed altered as they approach the plasma. This destabilization is detectable from oscillations in the amount of EUV energy generated. To reduce the oscillations by stabilizing the plasma and travel of the droplets, a proportional-integral (PI) controller algorithm is used to modify an energy of subsequent laser pulses based on the EUV energy generated in the chamber. By modifying the energy of subsequent laser pulses, the plasma stabilizes, which reduces effects on droplet flight and stabilizes the amount of EUV energy generated, allowing the plasma chamber to operate for longer intervals and to lower the amount of reserve power maintained by a laser source.
Abstract translation: 在激光产生的等离子体（LPP）极紫外（EUV）系统中，通过激光脉冲照射液滴，以在室中产生等离子体。 这产生使等离子体不稳定并且随后的液滴使其飞行轨迹和速度在接近等离子体时改变的力。 这种不稳定性可以由产生的EUV能量的振荡来检测。 为了通过稳定等离子体和液滴的行程来减少振荡，使用比例积分（PI）控制器算法来修改基于腔室中产生的EUV能量的后续激光脉冲的能量。 通过修改后续激光脉冲的能量，等离子体稳定，这降低了对液滴飞行的影响，并稳定了产生的EUV能量的量，允许等离子体室工作更长的间隔，并降低由激光源维持的备用功率的量 。
-
公开(公告)号：US20170048957A1
公开(公告)日：2017-02-16
申请号：US14824141
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
CPC classification number: H05G2/008
Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
Abstract translation: 一种方法包括提供包含当转换成等离子体时发射极紫外（EUV）光的成分的靶材料; 将第一辐射束引导到目标材料以将能量传递到目标材料以改变目标材料的几何分布以形成修改的靶; 将第二射束照射到修改的目标物上，第二辐射束将至少部分改性靶转换成发射EUV光的等离子体; 测量与所述目标材料和所述修改的目标物中的一种或多种相对于所述第一辐射束相关联的一个或多个特性; 以及基于所述一个或多个测量特性将预定辐射量从所述第一射线辐射传送到预定能量范围内。
-
-
-
-
-
-
-
-
-
Search Results
22
records
(took 0.024 seconds)
