再颁专利
- 专利标题： Electron beam exposure system
- 专利标题（中）： 电子束曝光系统
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申请号： US395853申请日： 1982-07-06
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公开(公告)号： USRE31630E公开(公告)日： 1984-07-17
- 发明人: Eiichi Goto , Takashi Souma , Masanori Idesawa , Kazumitsu Tanaka
- 申请人： Eiichi Goto , Takashi Souma , Masanori Idesawa , Kazumitsu Tanaka
- 申请人地址： JPX Saitamaken JPX Tokyo
- 专利权人： Rikagaku Kenkyusho,Nihon Denshi Kabushiki Kaisha
- 当前专利权人： Rikagaku Kenkyusho,Nihon Denshi Kabushiki Kaisha
- 当前专利权人地址： JPX Saitamaken JPX Tokyo
- 优先权： JPX51-69103 19760611
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; H01J37/30
摘要：
An electron beam with a cross-section shaped by two aperture plates and a deflector sequentially irradiates pattern areas within a plurality of unit squares on a workpiece in the X and Y directions. The workpiece is continuously shifted in the Y direction by a mechanical means, the amount of workpiece shift being detected to control the deflector and the shaping of said beam cross-section.
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