公开(公告)号：US4117340A

公开(公告)日：1978-09-26

申请号：US801812

申请日：1977-05-31

申请人： Eiichi Goto ,  Takashi Souma ,  Masanori Idesawa ,  Kazumitsu Tanaka

发明人： Eiichi Goto ,  Takashi Souma ,  Masanori Idesawa ,  Kazumitsu Tanaka

IPC分类号： H01L21/027 ,  H01J37/30 ,  H01J37/20

CPC分类号： H01J37/3007

摘要： An electron beam with a cross-section shaped by two aperture plates and a deflector sequentially irradiates pattern areas within a plurality of unit squares on a workpiece in the X and Y directions. The workpiece is continuously shifted in the Y direction by a mechanical means, the amount of workpiece shift being detected to control the deflector and the shaping of said beam cross-section.

公开(公告)号：USRE31630E

公开(公告)日：1984-07-17

申请号：US395853

申请日：1982-07-06

申请人： Eiichi Goto ,  Takashi Souma ,  Masanori Idesawa ,  Kazumitsu Tanaka

发明人： Eiichi Goto ,  Takashi Souma ,  Masanori Idesawa ,  Kazumitsu Tanaka

IPC分类号： H01L21/027 ,  H01J37/30

CPC分类号： H01J37/3007

摘要： An electron beam with a cross-section shaped by two aperture plates and a deflector sequentially irradiates pattern areas within a plurality of unit squares on a workpiece in the X and Y directions. The workpiece is continuously shifted in the Y direction by a mechanical means, the amount of workpiece shift being detected to control the deflector and the shaping of said beam cross-section.

公开(公告)号：US4151422A

公开(公告)日：1979-04-24

申请号：US913397

申请日：1978-06-07

申请人： Eiichi Goto ,  Takashi Souma ,  Masanori Idesawa ,  Tetsuo Yuasa

发明人： Eiichi Goto ,  Takashi Souma ,  Masanori Idesawa ,  Tetsuo Yuasa

IPC分类号： H01J37/305 ,  H01J37/30 ,  H01J37/302 ,  H01L21/027 ,  A61K27/02

CPC分类号： H01J37/3007 ,  H01J37/3026

摘要： An electron beam having a narrow rectangular cross section, shaped by two aperture plates and a deflector, is scanned over a workpiece or specimen. The length and width of the narrow rectangular cross section, relative to beam scanning, in accordance with the shape of the pattern being exposed.

摘要翻译： 具有由两个孔板和导流板成形的窄矩形横截面的电子束在工件或样品上扫描。 相对于光束扫描的窄矩形横截面的长度和宽度根据图案的形状被暴露。