- 专利标题: Method and device for irradiating spots on a layer
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申请号: US13079969申请日: 2011-04-05
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公开(公告)号: USRE46433E1公开(公告)日: 2017-06-13
- 发明人: Jacobus Hermanus Maria Neijzen , Helmar Van Santen
- 申请人: Jacobus Hermanus Maria Neijzen , Helmar Van Santen
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 优先权: EP02080392 20021219
- 国际申请: PCT/IB03/05344 WO 20031120
- 国际公布: WO2004/057589 WO 20040708
- 主分类号: G01G5/00
- IPC分类号: G01G5/00 ; G03B27/52 ; G03B27/42 ; G03C5/00 ; B82Y10/00 ; G03F7/20 ; G11B7/122 ; G11B7/26 ; G11B7/1374
摘要:
For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.
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