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公开(公告)号：US07399978B2
公开(公告)日：2008-07-15
申请号：US10539351
申请日：2003-11-20
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.
摘要翻译： 为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于光学元件的相对运动，使得相继地照射该层的不同部分和在该层的表面之间的间隙 保持最靠近层的光学元件。 此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应管道供给，并通过总投影横截面通过面积流出流出开口 在与平面平行的平面上。 流出开口或多个流出开口定位成使得从垂直于该层的方向看，总横截面积在该空间部分中的中心，辐射辐射穿过该点。
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公开(公告)号：US07514699B2
公开(公告)日：2009-04-07
申请号：US10539313
申请日：2003-11-20
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.
摘要翻译： 为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于透镜的相对运动，使得相继地照射该层的不同部分和透镜表面之间的间隙 最靠近层保持。 此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应导管供给。 至少一部分液体填充了辐射照射到该点的凹槽。
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公开(公告)号：USRE46433E1
公开(公告)日：2017-06-13
申请号：US13079969
申请日：2011-04-05
IPC分类号： G01G5/00 , G03B27/52 , G03B27/42 , G03C5/00 , B82Y10/00 , G03F7/20 , G11B7/122 , G11B7/26 , G11B7/1374
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.
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4.发明授权Device for directing radiation to a layer, apparatus with such device and method using such apparatus 失效用于将辐射引导到层的装置，具有这种装置的装置和使用这种装置的方法公开(公告)号：US07605979B2
公开(公告)日：2009-10-20
申请号：US11911559
申请日：2006-04-13
CPC分类号： G11B7/261 , G03F7/70383 , G03F7/70583
摘要： A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality. Further an apparatus comprising such a device and a method using such an apparatus are disclosed.
摘要翻译： 描述了用于将辐射引导到层（1）的装置。 该装置包括用于将源自第一辐射源（S1）的第一辐射束（B1）聚焦到所述层上的第一光学元件（L1），用于聚焦源自第二辐射源 第二辐射源（S2）到所述层上。 来自所述第一和第二辐射源的辐射的波长彼此不同。 第一和第二光学元件可相对于所述辐射源共同移动，其中两个辐射束的焦点至少基本上与第一光学元件和第二光学元件相对于辐射源的各种运动重合。 第二光学元件（L2）具有孔（A2），其允许第一辐射束（B1）的光学上不受干扰地通过。 以这种方式实现L1和L2的紧凑且轻的配置以及改进的辐射束质量。 此外，公开了一种包括这种装置的装置和使用这种装置的方法。
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5.发明授权公开(公告)号：US07642297B2
公开(公告)日：2010-01-05
申请号：US10568837
申请日：2004-08-05
申请人： Emile Johannes Karel Verstegen , Johan George Kloosterboer , Hendrik Roelof Stapert , Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Emile Johannes Karel Verstegen , Johan George Kloosterboer , Hendrik Roelof Stapert , Jacobus Hermanus Maria Neijzen , Helmar Van Santen
CPC分类号： C09J135/02
摘要： A non-leaching adhesive system and its use in a liquid immersion objective for immersion-writing of masters for optical discs are disclosed. The adhesive system comprises at least one monomer, selected from among the group of acrylate and methacrylate monomers, allylic monomers, norbornene monomers, hybrid monomers thereof, containing chemically different polymeriazble groups, and multifunctional thiol monomers, provided that said thiol is used in combination with at least one of said non-thiol monomers; and a polymerization initiator. At least one of said monomers, not being a thiol, is provided with at least two functional polymerizable groups to obtain a crosslinked polymer network. The polymerization initiator is preferably an initiator that can be activated both thermally and with UV radiation. The adhesive system may further contain a reactive diluent. Further the use of the present adhesive system in mounting a liquid immersion objective is disclosed.
摘要翻译： 公开了一种非浸出粘合剂系统及其在用于浸入式写入光盘的液浸物镜中的用途。 粘合剂体系包含至少一种选自丙烯酸酯和甲基丙烯酸酯单体的单体，烯丙基单体，降冰片烯单体，含有化学上不同的聚合物基团的杂化单体和多官能硫醇单体，条件是所述硫醇与 所述非硫醇单体中的至少一种; 和聚合引发剂。 至少一种所述单体（不是硫醇）具有至少两个官能的可聚合基团以获得交联的聚合物网络。 聚合引发剂优选是能够以热辐射和UV辐射活化的引发剂。 粘合剂体系还可以含有反应性稀释剂。 此外，公开了本发明的粘合剂系统在安装液浸物镜中的用途。
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6.发明申请Device for Directing Radiation to a Layer, Apparatus with Such Device and Method Using Such Apparatus 失效用于将辐射定向到层的装置，具有这种装置的装置和使用这种装置的方法公开(公告)号：US20080186549A1
公开(公告)日：2008-08-07
申请号：US11911559
申请日：2006-04-13
IPC分类号： G02B26/08
CPC分类号： G11B7/261 , G03F7/70383 , G03F7/70583
摘要： A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality. Further an apparatus comprising such a device and a method using such an apparatus are disclosed.
摘要翻译： 描述了用于将辐射引导到层（1）的装置。 该装置包括用于将源自第一辐射源（S1）的第一辐射束（B 1）聚焦到所述层上的第一光学元件（L 1），用于聚焦第二辐射束的第二光学元件（L 2） B 2）源自第二辐射源（S 2）到所述层上。 来自所述第一和第二辐射源的辐射的波长彼此不同。 第一和第二光学元件可相对于所述辐射源共同移动，其中两个辐射束的焦点至少基本上与第一光学元件和第二光学元件相对于辐射源的各种运动重合。 第二光学元件（L 2）具有允许第一辐射束（B 1）的光学上不受干扰地通过的孔径（A 2）。 以这种方式，实现了L 1和L 2的紧凑和轻型结构以及改进的辐射束质量。 此外，公开了一种包括这种装置的装置和使用这种装置的方法。
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公开(公告)号：US07354698B2
公开(公告)日：2008-04-08
申请号：US11030326
申请日：2005-01-07
申请人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
发明人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.
摘要翻译： 公开了一种压印方法，其包括在辐射下以可流动状态在基板上照射可光固化的可印刷介质以引发介质的固化，在照射之后，使介质与模板接触以在介质中形成印记， 介质基本上固化，使得介质处于基本不可流动的状态，同时介质与模板接触，并且当介质处于基本上不可流动的状态时将模板与介质分离。
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公开(公告)号：US09057967B2
公开(公告)日：2015-06-16
申请号：US12512754
申请日：2009-07-30
申请人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
发明人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个 的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。
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9.发明授权Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure 有权平版印刷设备和器件制造方法，其具有在液体限制结构的孔的上方的液体入口公开(公告)号：US08797503B2
公开(公告)日：2014-08-05
申请号：US13149404
申请日：2011-05-31
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.
摘要翻译： 在光刻设备中，液体供应系统将液体提供到工作台与光学元件之间的空间并与光学元件的表面相接触，该空间的横截面积小于衬底的面积， 液体供应系统包括沿着光学元件表面和工作台之间的空间的边界的至少一部分延伸的液体限制结构，其中液体限制结构的至少一部分位于光学元件表面和工作台之间， 所述液体限制结构的至少一部分具有所述图案化束可以穿过的孔，所述液体限制结构包括将所述液体供应到所述孔上方的空间的入口，并且所述液体限制结构包括用于除去所述液体的出口， 由入口提供，从孔下方的空间。
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公开(公告)号：US08241550B2
公开(公告)日：2012-08-14
申请号：US12574211
申请日：2009-10-06
IPC分类号： B29C59/00
CPC分类号： B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持压印模板，衬底台和光学编码器的模板保持器，所述光学编码器具有辐射输出，第一衍射光栅和检测器，所述辐射输出被布置成照亮 第二衍射光栅和检测器，定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。
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