The invention is directed to a base-pad (2) for placement under a polishing pad (1) for use with a polishing fluid during a polishing operation, the base-pad (2) having a layer (7) with vertical elongated pores that absorb polishing fluid and that confine absorbed polishing fluid from transport laterally in the base-pad (2). Micropores in the layer (7) are impermeable to the polishing fluid and permeable to gasses.