Invention Application
- Patent Title: 露光装置及びデバイス製造方法
- Patent Title (English): Aligner and method for fabricating device
- Patent Title (中): 对准器和制造器件的方法
-
Application No.: PCT/JP2002/009954Application Date: 2002-09-26
-
Publication No.: WO2003030229A1Publication Date: 2003-04-10
- Inventor: 大和 壮一 , 長坂 博之
- Applicant: 株式会社ニコン , 大和 壮一 , 長坂 博之
- Applicant Address: 〒100-8331 東京都 千代田区 丸の内3丁目2番3号 Tokyo JP
- Assignee: 株式会社ニコン,大和 壮一,長坂 博之
- Current Assignee: 株式会社ニコン,大和 壮一,長坂 博之
- Current Assignee Address: 〒100-8331 東京都 千代田区 丸の内3丁目2番3号 Tokyo JP
- Agency: 志賀 正武
- Priority: JP2001-298265 20010927
- Main IPC: H01L21/027
- IPC: H01L21/027
Abstract:
An aligner in which light absorbing substances can be removed appropriately from the space between a projection optical system and a substrate without having any effect on the peripheral apparatus. The aligner has a gas supply port for supplying an energy-beam-permeable gas to the space between the projection optical system and the substrate, and an exhaust port provided on the outside of the gas supply port while being directed toward the space and discharging a gas containing the permeable gas from the space at a rate higher than the supply rate of the permeable gas.
Information query
IPC分类: