Invention Application
WO2005081658A3 METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) PROCESS AND APPARATUS TO PRODUCE MULTI-LAYER HIGH-TEMPERATURE SUPERCONDUCTING (HTS) COATED TAPE
审中-公开
金属化学气相沉积（MOCVD）工艺和生产多层高温超导（HTS）涂层胶带的设备
- Patent Title: METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) PROCESS AND APPARATUS TO PRODUCE MULTI-LAYER HIGH-TEMPERATURE SUPERCONDUCTING (HTS) COATED TAPE
- Patent Title (中): 金属化学气相沉积（MOCVD）工艺和生产多层高温超导（HTS）涂层胶带的设备
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Application No.: PCT/US2004016639Application Date: 2004-05-25
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Publication No.: WO2005081658A3Publication Date: 2006-01-12
- Inventor: SELVAMANICKAM VENKAT , LEE HEE-GYOUN
- Applicant: SUPERPOWER INC
- Assignee: SUPERPOWER INC
- Current Assignee: SUPERPOWER INC
- Priority: US60246803 2003-06-23
- Main IPC: C04B35/45
- IPC: C04B35/45 ; C23C16/00 ; C23C16/40 ; C23C16/455 ; C23C16/54 ; H01L39/12 ; H01L39/24 ; B05B13/02 ; B32B9/00
Abstract:
An OCVD apparatus and process for producing multi-layer HTS-coated tapes with increased current capacity which includes multiple liquid precursor sources, each having an associated pump and vaporizer, the outlets of which feed a multiple compartment showerhead apparatus within an MOCVD reactor. The multiple compartment showerhead apparatus is located in close proximity to an associated substrate heater which together define multiple deposition sectors in a deposition zone.
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