Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
- Patent Title (中): LITHOGRAPHIC设备和设备制造方法
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Application No.: PCT/NL2007/050469Application Date: 2007-09-25
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Publication No.: WO2008044925A2Publication Date: 2008-04-17
- Inventor: VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , DE KUSTER, Johannes, Peterus, Henricus , MOORS, Johannes, Hubertus, Josephina , STEVENS, Lucas, Henricus, Johannes , WOLSCHRIJN, Bastiaan, Theodoor , SIDELNIKOV, Yurii, Victorovitch , VAN DER VELDEN, Marc, Hubertus, Lorenz , SOER, Wouter, Anthon , GIELISSEN, Kurt , STEIN, Thomas
- Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT AG , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , DE KUSTER, Johannes, Peterus, Henricus , MOORS, Johannes, Hubertus, Josephina , STEVENS, Lucas, Henricus, Johannes , WOLSCHRIJN, Bastiaan, Theodoor , SIDELNIKOV, Yurii, Victorovitch , VAN DER VELDEN, Marc, Hubertus, Lorenz , SOER, Wouter, Anthon , GIELISSEN, Kurt , STEIN, Thomas
- Applicant Address: De Run 6501 NL-5504 DR Veldhoven NL
- Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT AG,VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus,BANINE, Vadim, Yevgenyevich,DE KUSTER, Johannes, Peterus, Henricus,MOORS, Johannes, Hubertus, Josephina,STEVENS, Lucas, Henricus, Johannes,WOLSCHRIJN, Bastiaan, Theodoor,SIDELNIKOV, Yurii, Victorovitch,VAN DER VELDEN, Marc, Hubertus, Lorenz,SOER, Wouter, Anthon,GIELISSEN, Kurt,STEIN, Thomas
- Current Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT AG,VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus,BANINE, Vadim, Yevgenyevich,DE KUSTER, Johannes, Peterus, Henricus,MOORS, Johannes, Hubertus, Josephina,STEVENS, Lucas, Henricus, Johannes,WOLSCHRIJN, Bastiaan, Theodoor,SIDELNIKOV, Yurii, Victorovitch,VAN DER VELDEN, Marc, Hubertus, Lorenz,SOER, Wouter, Anthon,GIELISSEN, Kurt,STEIN, Thomas
- Current Assignee Address: De Run 6501 NL-5504 DR Veldhoven NL
- Agency: HATZMANN, M., J.
- Priority: US11/544,930 20061010
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
Information query
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