公开(公告)号：WO2009083175A1

公开(公告)日：2009-07-09

申请号：PCT/EP2008/010886

申请日：2008-12-19

Applicant: ASML NETHERLANDS B.V. ,  SIDELNIKOV, Yurii, Victorovitch ,  BANINE, Valdim, Yevgenyevich ,  KOSHELEV, Konstantin, Nikolaevich ,  FRIJNS, Olav, Waldemar, Vladimir ,  KRIVTSUN, Vladimir, Mihailovitch

Inventor： SIDELNIKOV, Yurii, Victorovitch ,  BANINE, Valdim, Yevgenyevich ,  KOSHELEV, Konstantin, Nikolaevich ,  FRIJNS, Olav, Waldemar, Vladimir ,  KRIVTSUN, Vladimir, Mihailovitch

IPC: H05G2/00

CPC classification number: H05G2/003

Abstract: A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about (1) Pa and about (10) Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium.

Abstract translation: 辐射源被构造和布置成产生极紫外辐射。 辐射源包括腔室，至少部分地容纳在腔室中的第一电极，至少部分地容纳在腔室中的第二电极，以及构造和布置成向腔室提供放电气体的供应源。 第一电极和第二电极被配置为在放电气体中产生放电以形成等离子体，以产生极紫外辐射。 源还包括构造和布置成在靠近放电的位置处提供在约（1）Pa和约（10）Pa之间的分压的气体的气体供应。 气体选自氢，氦和氢和氦的混合物。

公开(公告)号：WO2008044925A2

公开(公告)日：2008-04-17

申请号：PCT/NL2007/050469

申请日：2007-09-25

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  BANINE, Vadim, Yevgenyevich ,  DE KUSTER, Johannes, Peterus, Henricus ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  WOLSCHRIJN, Bastiaan, Theodoor ,  SIDELNIKOV, Yurii, Victorovitch ,  VAN DER VELDEN, Marc, Hubertus, Lorenz ,  SOER, Wouter, Anthon ,  GIELISSEN, Kurt ,  STEIN, Thomas

Inventor： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  BANINE, Vadim, Yevgenyevich ,  DE KUSTER, Johannes, Peterus, Henricus ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  WOLSCHRIJN, Bastiaan, Theodoor ,  SIDELNIKOV, Yurii, Victorovitch ,  VAN DER VELDEN, Marc, Hubertus, Lorenz ,  SOER, Wouter, Anthon ,  GIELISSEN, Kurt ,  STEIN, Thomas

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract translation: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：WO2008044925A3

公开(公告)日：2009-03-05

申请号：PCT/NL2007050469

申请日：2007-09-25

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG ,  VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNS ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

Inventor： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNES ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector (10A) and a second radiation dose detector (10B), each detector comprising a secondary electron emission surface (11) configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter (13), connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract translation: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器（10A）和第二辐射剂量检测器（10B），每个检测器包括二次电子发射表面（11），其被配置为接收辐射通量并由于接收到辐射而发射二次电子 通量，相对于辐射传播方向观察到的相对于第二辐射剂量检测器位于上游的第一辐射剂量检测器和连接到每个检测器的仪表（13），以检测由二次电子产生的电流或电压 从各个电子发射表面发射。

公开(公告)号：WO2008100143A1

公开(公告)日：2008-08-21

申请号：PCT/NL2008/050082

申请日：2008-02-14

Applicant: ASML NETHERLANDS B.V. ,  KRIVTSUN, Vladimir Mihailovitch ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOROP, Evgeny Dmitrievich ,  KOSHELEV, Konstantin Nikolaevitch ,  SIDELNIKOV, Yurii Victorovitch ,  YAKUSHEV, Oleg

Inventor： KRIVTSUN, Vladimir Mihailovitch ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOROP, Evgeny Dmitrievich ,  KOSHELEV, Konstantin Nikolaevitch ,  SIDELNIKOV, Yurii Victorovitch ,  YAKUSHEV, Oleg

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source (24), and a foil trap (25) provided with a plurality of thin foils (20) that extend substantially parallel to the direction of radiation from the plasma source (20). A grid (22) is disposed between the plasma radiation source (20) and the foil trap (24). A space is located between the grid (22) and the foil trap (24). The apparatus also include an electrical potential application circuit (28) that is constructed and arranged to apply an electrical potential to the grid (22) so that the grid (22) repels electrons emitted by the plasma radiation source (22) and creates a positive space charge between the grid (20) and the foil trap (24) to deflect ions emitted by the plasma radiation source (20) to the foil trap (24).

Abstract translation: 用于形成电磁辐射束的装置包括等离子体辐射源（24）和设置有多个薄箔（20）的箔捕获器（25），其基本平行于等离子体源（20）的辐射方向延伸 ）。 栅极（22）设置在等离子体辐射源（20）和箔阱（24）之间。 一个空间位于网格（22）和箔片陷阱（24）之间。 该装置还包括电位施加电路（28），其构造和布置成向电网（22）施加电势，使得电网（22）排斥由等离子体辐射源（22）发射的电子并产生正的 格栅（20）和箔捕获器（24）之间的空间电荷以将由等离子体辐射源（20）发射的离子偏转到箔捕获器（24）。