Invention Application
WO2008134615A2 METALLIZATION WITH TAILORABLE COEFFICIENT OF THERMAL EXPANSION 审中-公开
具有可热膨胀系数的金属化

METALLIZATION WITH TAILORABLE COEFFICIENT OF THERMAL EXPANSION
Abstract:
The present invention is directed to an interconnect for an implantable medical device. The interconnect includes a pad and a first layer introduced over the pad. At least one of the pad or the first layer comprise a negative coefficient of thermal expansion (CTE) material.
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