Invention Application
- Patent Title: METHOD OF SURFACE TREATING MICROFLUIDIC DEVICES
- Patent Title (中): 表面处理微流体装置的方法
-
Application No.: PCT/EP2010/058631Application Date: 2010-06-18
-
Publication No.: WO2010146153A1Publication Date: 2010-12-23
- Inventor: GANDHIRAMAN, Ram Prasad , BASABE-DESMONTS, Lourdes , RIAZ, Asif , LEE, Luke , DIMOV, Ivan , DUCREE, Jens , DANIELS, Stephen Michael
- Applicant: DUBLIN CITY UNIVERSITY , GANDHIRAMAN, Ram Prasad , BASABE-DESMONTS, Lourdes , RIAZ, Asif , LEE, Luke , DIMOV, Ivan , DUCREE, Jens , DANIELS, Stephen Michael
- Applicant Address: Collins Avenue Glasnevin Dublin, 9 IE
- Assignee: DUBLIN CITY UNIVERSITY,GANDHIRAMAN, Ram Prasad,BASABE-DESMONTS, Lourdes,RIAZ, Asif,LEE, Luke,DIMOV, Ivan,DUCREE, Jens,DANIELS, Stephen Michael
- Current Assignee: DUBLIN CITY UNIVERSITY,GANDHIRAMAN, Ram Prasad,BASABE-DESMONTS, Lourdes,RIAZ, Asif,LEE, Luke,DIMOV, Ivan,DUCREE, Jens,DANIELS, Stephen Michael
- Current Assignee Address: Collins Avenue Glasnevin Dublin, 9 IE
- Agency: MOORE, Barry et al.
- Priority: GB0910626.1 20090619
- Main IPC: B01L3/00
- IPC: B01L3/00 ; B05D7/22 ; C23C16/04 ; C23C16/505
Abstract:
The formation of a barrier layer within individual channels or cavities of a microfluidic device is described. The barrier layer is effected through a gas phase deposition process, desirably implemented in a plasma environment.
Information query
IPC分类:
