Invention Application
- Patent Title: METAL DEPOSITION
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Application No.: PCT/US2010/054653Application Date: 2010-10-29
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Publication No.: WO2011059798A1Publication Date: 2011-05-19
- Inventor: KOSOWSKY, Lex
- Applicant: SHOCKING TECHNOLOGIES, INC. , KOSOWSKY, Lex
- Applicant Address: 5870 Hellyer Avenue San Jose, California 95138 US
- Assignee: SHOCKING TECHNOLOGIES, INC.,KOSOWSKY, Lex
- Current Assignee: SHOCKING TECHNOLOGIES, INC.,KOSOWSKY, Lex
- Current Assignee Address: 5870 Hellyer Avenue San Jose, California 95138 US
- Agency: KLINE, Keith et al.
- Priority: US12/608,315 20091029
- Main IPC: C25D5/48
- IPC: C25D5/48
Abstract:
Systems and methods include depositing one or more materials on a voltage switchable dielectric material. In certain aspects, a voltage switchable dielectric material is disposed on a conductive backplane. In some embodiments, a voltage switchable dielectric material includes regions having different characteristic voltages associated with deposition thereon. Some embodiments include masking, and may include the use of a removable contact mask. Certain embodiments include electrografting. Some embodiments include an intermediate layer disposed between two layers.
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