Invention Application
WO2011137071A2 METHODS AND APPARATUS FOR CALIBRATING FLOW CONTROLLERS IN SUBSTRATE PROCESSING SYSTEMS
审中-公开
用于在基板处理系统中校准流量控制器的方法和装置
- Patent Title: METHODS AND APPARATUS FOR CALIBRATING FLOW CONTROLLERS IN SUBSTRATE PROCESSING SYSTEMS
- Patent Title (中): 用于在基板处理系统中校准流量控制器的方法和装置
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Application No.: PCT/US2011/033780Application Date: 2011-04-25
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Publication No.: WO2011137071A2Publication Date: 2011-11-03
- Inventor: CRUSE, James P. , LANE, John W. , GREGOR, Mariusch , BUCKIUS, Duc , DARAN, Berrin , COBB, Corie Lynn , XU, Ming , NGUYEN, Andrew
- Applicant: APPLIED MATERIALS, INC. , CRUSE, James P. , LANE, John W. , GREGOR, Mariusch , BUCKIUS, Duc , DARAN, Berrin , COBB, Corie Lynn , XU, Ming , NGUYEN, Andrew
- Applicant Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Assignee: APPLIED MATERIALS, INC.,CRUSE, James P.,LANE, John W.,GREGOR, Mariusch,BUCKIUS, Duc,DARAN, Berrin,COBB, Corie Lynn,XU, Ming,NGUYEN, Andrew
- Current Assignee: APPLIED MATERIALS, INC.,CRUSE, James P.,LANE, John W.,GREGOR, Mariusch,BUCKIUS, Duc,DARAN, Berrin,COBB, Corie Lynn,XU, Ming,NGUYEN, Andrew
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Agency: TABOADA, Alan
- Priority: US12/915,345 20101029; US61/330,056 20100430
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01L21/66
Abstract:
Methods and apparatus for calibrating a plurality of gas flows in a substrate processing system are provided herein. In some embodiments, a substrate processing system may include a cluster tool comprising a first process chamber and a second process chamber coupled to a central vacuum transfer chamber; a first flow controller to provide a process gas to the first process chamber; a second flow controller to provide the process gas to the second process chamber; a mass flow verifier to verify a flow rate from each of the first and second flow controllers; a first conduit to selectively couple the first flow controller to the mass flow verifier; and a second conduit to selectively couple the second flow controller to the mass flow verifier.
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