Invention Application
- Patent Title: PLASMA GENERATOR
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Application No.: PCT/EP2012/069226Application Date: 2012-09-28
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Publication No.: WO2013045636A9Publication Date: 2013-04-04
- Inventor: SMITS, Marc , LODEWIJK, Chris Franciscus Jessica
- Applicant: MAPPER LITHOGRAPHY IP B.V.
- Applicant Address: Computerlaan 15 NL-2628 XK Delft NL
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: Computerlaan 15 NL-2628 XK Delft NL
- Agency: MOOIJ, Maarten et al.
- Priority: US61/540,396 20110928; US61/637,651 20120424; US61/648,123 20120517
- Main IPC: H05H1/30
- IPC: H05H1/30 ; H05H1/46
Abstract:
An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) comprising a primary source chamber (15) and a first coil (4) for generating plasma in the primary source chamber, a secondary plasma source (25) comprising a secondary source chamber (16) and a second coil (26) for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet (14) for emitting at least a portion of the plasma generated by the arrangement.
Information query
IPC分类: