公开(公告)号：WO2014177718A1

公开(公告)日：2014-11-06

申请号：PCT/EP2014/059106

申请日：2014-05-05

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： KUIPER, Vincent Sylvester ,  SLOT, Erwin

IPC: H01J37/317 ,  H01J37/09

CPC classification number: H01J37/3177 ,  H01J37/09 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a li parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, a wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

Abstract translation: 一种用于从一个或多个带电粒子束形成多个子光束的子光束孔径阵列。 子光束孔径阵列包括一个或多个光束区域，每个光束区域包括以非正六边形图案布置的多个子光束孔径，子光束孔径布置成使得当沿第一方向投影到 在平行于第二方向的方向上，子光束孔沿着线均匀间隔，其中第一方向与第二方向不同。 该系统还包括具有以一组或多组布置的多个子束孔的子束孔阵列。 子束孔径阵列被布置成接收子束并在子束阵列的子束孔的位置处形成多个子束。

公开(公告)号：WO2013037856A1

公开(公告)日：2013-03-21

申请号：PCT/EP2012/067879

申请日：2012-09-12

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  PEIJSTER, Jerry Johannes Martinus ,  VERBEEK, Diederik Geert Femme

Inventor： PEIJSTER, Jerry Johannes Martinus ,  VERBEEK, Diederik Geert Femme

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/709 ,  H01J37/02 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/28

Abstract: The invention relates to a substrate processing apparatus (10) comprising a support frame (60), a radiation projection system (20) for projecting radiation onto a substrate to be processed, a substrate support structure (30) for supporting the substrate, and a fluid transfer system (150). The radiation projection system comprises a cooling arrangement (130) and is supported by and vibrationally decoupled from the support frame such that vibrations of the support frame above a predetermined maximum frequency are substantially decoupled from the radiation projection system. The fluid transfer system comprises at least one tube (140) fixed at two points (151,152), and comprises a flexible portion. A substantial part of the flexible portion extends over a plane substantially parallel to the substrate support structure surface. The stiffness of the flexible portion is adapted to substantially decouple vibrations at the second fixed point which are above the predetermined maximum frequency from the first fixed point.

Abstract translation: 本发明涉及一种基板处理装置（10），其包括支撑框架（60），用于将辐射投射到待处理的基板上的辐射投影系统（20），用于支撑基板的基板支撑结构（30） 流体输送系统（150）。 辐射投影系统包括冷却装置（130）并且被支撑并与支撑框架振动地分离，使得支撑框架在预定最大频率之上的振动基本上与辐射投影系统分离。 流体传送系统包括固定在两个点（151,152）处的至少一个管（140），并且包括柔性部分。 柔性部分的主要部分在基本上平行于基底支撑结构表面的平面上延伸。 柔性部分的刚度适于在第二固定点处大体上分离来自第一固定点的预定最大频率以上的振动。

公开(公告)号：WO2012156510A1

公开(公告)日：2012-11-22

申请号：PCT/EP2012/059269

申请日：2012-05-18

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  WIELAND, Marco Jan-Jaco ,  VAN NIEUWSTADT, Joris Anne Henri ,  VAN DE PEUT, Teunis

Inventor： WIELAND, Marco Jan-Jaco ,  VAN NIEUWSTADT, Joris Anne Henri ,  VAN DE PEUT, Teunis

IPC: H01J37/317

CPC classification number: G03B27/80 ,  B82Y10/00 ,  B82Y40/00 ,  G06F17/5081 ,  H01J37/3177 ,  H01J2237/31764 ,  H01J2237/31774

Abstract: The invention relates to a method for splitting a pattern for use in a multi-beamlet lithography apparatus. The method comprises providing an input pattern to be exposed onto a target surface by means of a plurality of beamlets of the multi-beamlet lithography apparatus. Within the input pattern first and second regions are identified. A first region is a region that is exclusively exposable by a single beamlet of the plurality of beamlets. A second region is a region that is exposable by more than one beamlet of the plurality of beamlets. On the basis of an assessment of the first and second regions it is determined what portion of the pattern is to be exposed by each beamlet.

Abstract translation: 本发明涉及一种分割用于多光束光刻设备中的图案的方法。 该方法包括通过多光束光刻设备的多个子束提供要暴露于目标表面上的输入图案。 在输入模式内，识别出第一和第二区域。 第一区域是由多个子束中的单个子束专门可曝光的区域。 第二区域是可由多个子束的多于一个子束曝光的区域。 基于对第一和第二区域的评估，确定图案的哪一部分将被每个子束曝光。

公开(公告)号：WO2012065941A1

公开(公告)日：2012-05-24

申请号：PCT/EP2011/070030

申请日：2011-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  WIELAND, Marco Jan-Jaco ,  VAN VEEN, Alexander Hendrik Vincent ,  DE JONG, Hendrik Jan

Inventor： WIELAND, Marco Jan-Jaco ,  VAN VEEN, Alexander Hendrik Vincent ,  DE JONG, Hendrik Jan

IPC: H01J37/04 ,  H01J37/22 ,  H01J37/317 ,  H01J37/09 ,  H01J37/24

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, and a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array. Each aperture array element comprises a plurality of apertures arranged in a plurality of groups, the apertures for letting the beamlets pass through the aperture array element, wherein the groups of apertures of each aperture array element form beam areas distinct and separate from a plurality of non-beam areas formed between the beam areas and containing no apertures for passage of the beamlets, and wherein the beam areas of the aperture array elements are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas of the aperture array elements are aligned to form non-beam shafts not having beamlets present therein. The first aperture array element is provided with cooling channels adapted for transmission of a cooling medium for cooling the first aperture array element, the cooling channels being provided in the non-beam areas of the first aperture array element.

Abstract translation: 一种用于将图案转印到目标表面上的带电粒子光刻系统，包括用于产生多个带电粒子子束的束发生器，所述多个子束限定列，以及多个孔阵列元件，包括第一孔径阵列， 遮光器阵列，光束停止阵列和投影透镜阵列。 每个孔阵列元件包括以多个组布置的多个孔，用于使子束通过孔径阵列元件的孔，其中每个孔阵列元件的孔组彼此不同，并且与多个非孔 - 光束区域形成在光束区域之间并且不包含用于子束通过的孔，并且其中孔阵列元件的光束区域对准以形成梁轴，每个梁轴包括多个子束，并且其中未射束区域 孔径阵列元件对齐以形成其中不存在子束的非光束轴。 第一孔阵列元件设置有适于传输用于冷却第一孔阵列元件的冷却介质的冷却通道，冷却通道设置在第一孔径阵列元件的非射束区域中。

公开(公告)号：WO2011051305A1

公开(公告)日：2011-05-05

申请号：PCT/EP2010/066199

申请日：2010-10-26

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  WIELAND, Marco Jan-Jaco ,  JAGER, Remco ,  VAN VEEN, Alexander Hendrik Vincent ,  STEENBRINK, Stijn Willem Herman Karel

Inventor： WIELAND, Marco Jan-Jaco ,  JAGER, Remco ,  VAN VEEN, Alexander Hendrik Vincent ,  STEENBRINK, Stijn Willem Herman Karel

IPC: H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator (3) for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array (10) having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation (9) device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. The modulation device comprises a plurality of apertures arranged in arrays for letting the beamlets pass through the modulation device, a plurality of modulators (30) arranged in arrays, each modulator provided with electrodes (32, 34) extending on opposing sides of an aperture for generating a voltage difference across the aperture, and a plurality of light sensitive elements (40) arranged in arrays, for receiving modulated light beams and converting the light beams into electric signals for actuating the modulators, wherein the light sensitive elements are located within the column, wherein the modulation device is subdivided into a plurality of alternating beam areas (51) and non-beam areas (52), the arrays of modulators are located in the beam areas, and the arrays of light sensitive elements are located in the non-beam areas and are in communication with the modulators in an adjacent beam area.

Abstract translation: 一种用于将图案转印到目标表面上的带电粒子光刻系统。 该系统包括用于产生多个带电粒子子束的束发生器（3），所述多个子束限定列，具有用于阻挡子束到达目标表面的表面的射束停止阵列（10） 用于允许子束到达目标表面的表面;以及用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面的调制（9）装置， 通过偏转或不偏转子束，使得子束被阻挡或不被阻挡阵列阻挡。 调制装置包括排列成阵列的多个孔，用于使子束通过调制装置，排列成阵列的多个调制器（30），每个调制器设置有在孔的相对侧上延伸的电极（32,34） 产生穿过该孔的电压差以及排列成阵列的多个光敏元件（40），用于接收调制的光束并将光束转换成用于致动调制器的电信号，其中光敏元件位于列内 ，其中所述调制装置被细分为多个交替光束区域（51）和非光束区域（52），所述调制器阵列位于所述光束区域中，并且所述光敏元件阵列位于所述非光束区域中， 并且与相邻波束区域中的调制器通信。

公开(公告)号：WO2010106053A2

公开(公告)日：2010-09-23

申请号：PCT/EP2010/053359

申请日：2010-03-16

Applicant: BIOeCON INTERNATIONAL HOLDING N.V. ,  MAKKEE, Michiel ,  MOULIJN, Jacob Adriaan ,  MENEGASSI DE ALMEIDA, Rafael ,  O'CONNOR, Paul

Inventor： MAKKEE, Michiel ,  MOULIJN, Jacob Adriaan ,  MENEGASSI DE ALMEIDA, Rafael ,  O'CONNOR, Paul

IPC: C07H1/00

CPC classification number: C07D493/04 ,  C07D307/20

Abstract: A process is disclosed for converting a polysaccharide-containing biomass material to platform chemicals. The process comprises dissolving the polysaccharides in an inorganic molten salt hydrate, converting the polysaccharides to monosaccharides, and converting the monosaccharides to dehvatized (di) anhydro sugars that are easily separable from the inorganic molten salt hydrate. The dehvatized (di) anhydro sugars are useful as fuel additives and fuel substitutes.

Abstract translation: 公开了将含多糖的生物质材料转化为平台化学品的方法。 该方法包括将多糖溶解在无机熔融盐水合物中，将多糖转化为单糖，并将单糖转化为易于与无机熔融盐水合物分离的脱氢化（二）脱氢糖。 脱氢（di）脱氢糖可用作燃料添加剂和燃料替代品。

公开(公告)号：WO2010094748A1

公开(公告)日：2010-08-26

申请号：PCT/EP2010/052072

申请日：2010-02-18

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  DE JONG, Hendrik Jan ,  WIELAND, Marco Jan-Jaco

Inventor： DE JONG, Hendrik Jan ,  WIELAND, Marco Jan-Jaco

IPC: H01L21/00 ,  G03F7/00

CPC classification number: G03F7/707 ,  H01L21/6838 ,  H01L21/68707 ,  H01L21/68742 ,  H01L21/6875 ,  H01L21/68785 ,  Y10T29/49815 ,  Y10T29/49998 ,  Y10T29/53

Abstract: The invention relates to a method of clamping a substrate (22) on a surface of a substrate support structure (23). First, a liquid is applied on a surface of the substrate support structure. The surface is provided with a plurality of contact elements. The liquid is applied such that the contact elements are fully covered by a liquid layer. Then the substrate is provided and placed onto the liquid layer. Finally, liquid underneath the substrate is removed such that the substrate rests on the plurality of contact elements and is clamped by means of a capillary clamping force exerted by a capillary layer of the liquid between the substrate and the surface of the substrate support structure.

Abstract translation: 本发明涉及一种在衬底支撑结构（23）的表面上夹持衬底（22）的方法。 首先，在衬底支撑结构的表面上施加液体。 该表面设置有多个接触元件。 施加液体使得接触元件完全被液体层覆盖。 然后将衬底提供并放置在液体层上。 最后，去除衬底下面的液体，使得衬底搁置在多个接触元件上，并且通过由衬底和衬底支撑结构的表面之间的液体的毛细管层施加的毛细管夹紧力来夹紧。

公开(公告)号：WO2010094724A1

公开(公告)日：2010-08-26

申请号：PCT/EP2010/052009

申请日：2010-02-17

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  BALTUSSEN, Sander ,  DE BOER, Guido ,  MAKKINK, Hugo Martijn ,  TEEPEN, Tijs Frans

Inventor： BALTUSSEN, Sander ,  DE BOER, Guido ,  MAKKINK, Hugo Martijn ,  TEEPEN, Tijs Frans

IPC: H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/00 ,  H01J37/317

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01L21/67161 ,  H01L21/6719

Abstract: A vacuum chamber (400) comprising a plurality of wall panels (510) enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members (504, 524, 528) for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members (522) provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.

Abstract translation: 一种真空室（400），包括围绕内部空间的多个壁板（510），其中所述壁板可移除地连接以形成所述室，所述多个连接构件用于定位所述壁板 以预定的布置。 真空室还包括设置在墙板边缘处的一个或多个密封构件（522）。 壁板被布置成使得由于在内部空间中形成真空而在壁板的边缘处形成真空密封。

公开(公告)号：WO2013171229A1

公开(公告)日：2013-11-21

申请号：PCT/EP2013/059963

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： VAN VEEN, Alexander Hendrik Vincent ,  URBANUS, Willem Henk

IPC: H01J37/30 ,  H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam; a collimator system (5a,5b,5c,5d; 72;300) for refracting the diverging charged particle beam; and a cooling arrangement (203) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.

Abstract translation: 本发明涉及用于曝光目标物的带电粒子光刻系统。 该系统包括用于产生带电粒子束的带电粒子束发生器; 用于从带电粒子束形成多个子束的孔径阵列（6） 以及用于将子束投影到目标表面上的小射束投影仪（12）。 带电粒子束发生器包括用于产生发散带电粒子束的带电粒子源（3） 用于折射发散带电粒子束的准直器系统（5a，5b，5c，5d; 72; 300） 以及用于从准直器系统去除热的冷却装置（203），所述冷却装置包括围绕准直器系统的至少一部分的主体。

公开(公告)号：WO2013171117A1

公开(公告)日：2013-11-21

申请号：PCT/EP2013/059604

申请日：2013-05-08

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： VAN DE PEUT, Teunis ,  DEN BOER, Hendrik

IPC: H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/0437 ,  H01J2237/2485 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: The invention relates to a modulation device for modulating charged particle beamlets in accordance with pattern data in a multi-beamlet charged particle lithography system. The device comprises a plate-like body, an array of beamlet deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive slab (201) for supplying electrical power to one or more of the power supply terminals (202-205). The plate-like body is divided into an elongated beam area (51) and an elongated non-beam area (52) positioned with their long edges adjacent to each other. The beamlet deflectors are located in the beam area. The control circuits are located in non-beam area. The conductive slab is connected to the control circuits in the non-beam area. The conductive slab comprises a plurality of thin conductive plates (202-205).

Abstract translation: 本发明涉及一种用于根据多子束带电粒子光刻系统中的图案数据调制带电粒子子束的调制装置。 该装置包括板状主体，​​子束偏转器阵列，用于提供至少两个不同电压的多个电源端子（202-205），多个控制电路和用于提供电气的导电板（201） 一个或多个电源端子（202-205）的电力。 板状体被分成细长的射束区域（51）和长边相邻的细长非光束区域（52）。 子束偏转器位于光束区域中。 控制电路位于非光束区域。 导电板连接到非射束区域中的控制电路。 导电板包括多个薄导电板（202-205）。