公开(公告)号：WO2017183980A2

公开(公告)日：2017-10-26

申请号：PCT/NL2017/050256

申请日：2017-04-21

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  KONING, Johan Joost ,  LODEWIJK, Chris Franciscus Jessica ,  MOOK, Hindrik Willem ,  LATTARD, Ludovic

IPC: H01J37/317 ,  H01J37/02

Abstract: A charged particle beam system is disclosed, comprising: -a charged particle beam generator for generating a beam of charged particles; -a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; -a source for providing a cleaning agent; -a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: -a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and -at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

Abstract translation: 公开了带电粒子束系统，其包括： - 用于产生带电粒子束的带电粒子束发生器; - 设置在真空室中的带电粒子光学镜筒，其中，所述带电粒子光学镜筒布置成用于将所述带电粒子束投射到目标上，并且其中，所述带电粒子光学镜筒包括带电粒子光学元件，用于影响所述带电粒子束 粒子; - 提供清洁剂的来源; - 连接到源的导管，用于将清洁剂引向带电粒子光学元件; 其中所述带电粒子光学元件包括： - 用于传输和/或影响所述带电粒子束的带电粒子传输孔径，以及 - 至少一个通风孔，用于在所述带电粒子的第一侧和第二侧之间提供流动路径 光学元件，其中所述通气孔具有比所述带电粒子发射孔的横截面大的横截面。 此外，公开了一种用于防止或去除带电粒子透射孔中的污染的方法，包括在束发生器处于活动状态时引入清洁剂的步骤。

公开(公告)号：WO2013139878A2

公开(公告)日：2013-09-26

申请号：PCT/EP2013/055865

申请日：2013-03-20

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： KRUIT, Pieter ,  SMITS, Marc

IPC: G03F7/20

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  F15D1/025 ,  G03F7/70925 ,  G21K2201/06 ,  H01J9/38 ,  H01J37/3007 ,  H01J37/3177 ,  H01J37/32862 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/327 ,  Y10T137/2082 ,  Y10T137/87571

Abstract: The invention relates to an arrangement for transporting radicals. The arrangement includes a plasma generator and a guiding body. The plasma generator includes a chamber (2) in which a plasma may be formed. The chamber has an inlet (5) for receiving an input gas, and one or more outlets (6) for removal of at least one of the plasma and radicals created therein. The guiding body is hollow and is arranged for guiding radicals formed in the plasma towards an area or volume at which contaminant deposition is to be removed. The chamber inlet is coupled to a pressure device (40) for providing a pulsed pressure into the chamber so as to create a flow in the guiding body.

Abstract translation: 本发明涉及一种输送自由基的装置。 该装置包括等离子体发生器和引导体。 等离子体发生器包括可以形成等离子体的腔室（2）。 腔室具有用于接收输入气体的入口（5）和用于去除其中产生的至少一种等离子体和自由基的一个或多个出口（6）。 引导体是中空的，并且被布置成用于将形成在等离子体中的自由基引导到要去除污染物沉积的区域或体积。 腔室入口联接到压力装置（40），用于向腔室提供脉冲压力，以便在引导体中产生流动。

公开(公告)号：WO2019049588A1

公开(公告)日：2019-03-14

申请号：PCT/JP2018/029695

申请日：2018-07-31

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc

IPC: G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70 ,  H01L21/67115 ,  H01L21/6875

Abstract: Methods and arrangement for clamping substrates to a support using adhesive material area disclosed. The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of the first surface; and placing the substrate onto the adhesive material, wherein the adhesive material forms a plurality of support locations supporting the substrate. Preferably the adhesive material is cured at least partly during the application of a substantially uniformly distributed force to the substrate in the direction of the support. The arrangements comprise a support comprising a first surface, for supporting the substrate via adhesive material, whereby the first surface defines a plane. Preferably it also comprises an arrangement for providing electromagnetic radiation, thermal energy, and/or a chemical substance to the adhesive material, and an arrangement for providing a substantially uniformly distributed force to the substrate in the direction of the support.

公开(公告)号：WO2017183980A4

公开(公告)日：2017-10-26

申请号：PCT/NL2017/050256

申请日：2017-04-21

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  KONING, Johan Joost ,  LODEWIJK, Chris Franciscus Jessica ,  MOOK, Hindrik Willem ,  LATTARD, Ludovic

IPC: H01J37/317 ,  H01J37/02

Abstract: A charged particle beam system is disclosed, comprising: • a charged particle beam generator for generating a beam (8) of charged particles; • a charged particle optical column (226) arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; • a source (62) for providing a cleaning agent; • a conduit (64) connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: • a charged particle transmitting aperture (46) for transmitting and/ or influencing the beam of charged particles, and • at least one vent hole (60) for providing a flow path between a first side and a second side of the charged particle optical element. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：WO2017183980A3

公开(公告)日：2017-10-26

申请号：PCT/NL2017/050256

申请日：2017-04-21

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  KONING, Johan Joost ,  LODEWIJK, Chris Franciscus Jessica ,  MOOK, Hindrik Willem ,  LATTARD, Ludovic

IPC: H01J37/317 ,  H01J37/02

Abstract: A charged particle beam system is disclosed, comprising: • a charged particle beam generator for generating a beam (8) of charged particles; • a charged particle optical column (226) arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; • a source (62) for providing a cleaning agent; • a conduit (64) connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: • a charged particle transmitting aperture (46) for transmitting and/ or influencing the beam of charged particles, and • at least one vent hole (60) for providing a flow path between a first side and a second side of the charged particle optical element. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：WO2013045643A3

公开(公告)日：2013-04-04

申请号：PCT/EP2012/069234

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  LODEWIJK, Chris, Franciscus, Jessica

IPC: H05H1/30 ,  H05H1/46

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) arranged for generating plasma, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to a secondary plasma source (25), and an outlet (14) for emitting at least a portion of the atomic radicals produced by the plasma from the arrangement.

公开(公告)号：WO2013045636A9

公开(公告)日：2013-04-04

申请号：PCT/EP2012/069226

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  LODEWIJK, Chris Franciscus Jessica

IPC: H05H1/30 ,  H05H1/46

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) comprising a primary source chamber (15) and a first coil (4) for generating plasma in the primary source chamber, a secondary plasma source (25) comprising a secondary source chamber (16) and a second coil (26) for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet (14) for emitting at least a portion of the plasma generated by the arrangement.

公开(公告)号：WO2013041569A1

公开(公告)日：2013-03-28

申请号：PCT/EP2012/068444

申请日：2012-09-19

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc

IPC: H01J37/317 ,  G03F7/20

CPC classification number: G01N23/22 ,  B82Y10/00 ,  B82Y40/00 ,  G01N33/0004 ,  G03F7/70608 ,  G03F7/70916 ,  H01J37/304 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/022 ,  H01J2237/31796

Abstract: A lithography system (10) comprising a radiation projection system (20) for projecting radiation onto a substrate, a substrate transport system (30) for loading and positioning the substrate to be processed in the path of the projected radiation, a control system (40) for controlling the substrate transport system to move the substrate, and a resist characterization system (50) arranged for determining whether a specific type of resist is suitable to be exposed by radiation within the lithography system. The resist characterization system (50) may be arranged for exposing the resist on a surface of the substrate with one or more radiation beams, measuring a mass distribution of molecular fragments emitted from the resist, predicting a growth rate of deposited molecular fragments on the basis of a growth rate model and the measured mass distribution, and comparing the expected growth rate with a predetermined threshold growth rate.

Abstract translation: 一种光刻系统（10），包括用于将辐射投射到基板上的辐射投影系统（20），用于在投影辐射的路径中加载和定位待处理基板的基板输送系统（30），控制系统 ），用于控制衬底传输系统以移动衬底;以及抗蚀剂表征系统（50），被布置用于确定特定类型的抗蚀剂是否适于通过光刻系统内的辐射曝光。 抗蚀剂表征系统（50）可以布置成用一个或多个辐射束将抗蚀剂暴露在衬底的表面上，测量从抗蚀剂发射的分子片段的质量分布，从而预测基于沉积的分子片段的生长速率 的增长率模型和测量的质量分布，并将预期增长率与预定的阈值增长率进行比较。