Invention Application
- Patent Title: VERY LOW CTE SLOPE DOPED SILICA-TITANIA GLASS
- Patent Title (中): 非常低的CTE斜率DOPED SILICA-TITANIA玻璃
-
Application No.: PCT/US2013/072146Application Date: 2013-11-27
-
Publication No.: WO2014085529A1Publication Date: 2014-06-05
- Inventor: ANNAMALAI, Sezhian , DURAN, Carlos, Alberto , HRDINA, Kenneth, Edward
- Applicant: CORNING INCORPORATED , ANNAMALAI, Sezhian , DURAN, Carlos, Alberto , HRDINA, Kenneth, Edward
- Applicant Address: 1 Riverfront Plaza Corning, New York 14831 US
- Assignee: CORNING INCORPORATED,ANNAMALAI, Sezhian,DURAN, Carlos, Alberto,HRDINA, Kenneth, Edward
- Current Assignee: CORNING INCORPORATED,ANNAMALAI, Sezhian,DURAN, Carlos, Alberto,HRDINA, Kenneth, Edward
- Current Assignee Address: 1 Riverfront Plaza Corning, New York 14831 US
- Agency: DOUGLAS, Walter, M
- Priority: US61/731,621 20121130; US13/835,039 20130315
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03B19/14 ; C03C4/00
Abstract:
The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt.% to 5 wt.% halogen, 50 ppm-wt. to 6 wt.% of one or more oxides of Al, Ta and Nb, 3 wt.% to 10 wt.% TiO 2 and the remainder SiO 2 . In an embodiment the halogen content can be in the range of 0.2 wt.% to 3 wt.% along with 50 ppm-wt. to 6 wt.% one or more oxides of Al, Ta and Nb, 3 wt.% to 10 wt.% TiO 2 and the remainder SiO 2 . In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a Active temperature T f of less than 875°C. In an embodiment T f is less than 825°C. In another embodiment T f is less than 775°C.
Information query