Invention Application
- Patent Title: GAS DIFFUSER HOLE DESIGN FOR IMPROVING EDGE UNIFORMITY
- Patent Title (中): 气体扩散孔设计改善边缘均匀性
-
Application No.: PCT/US2014/024963Application Date: 2014-03-12
-
Publication No.: WO2015016980A1Publication Date: 2015-02-05
- Inventor: ZHAO, Lai , FURUTA, Gaku , WANG, Qunhua , CHOI, Soo Young , LEE, Dongsuh , PARK, Beom Soo , YANG, Hsiao-Lin
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Agency: PATTERSON, B. Todd et al.
- Priority: US61/859,727 20130729; US61/866,928 20130816
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455
Abstract:
In one embodiment, a diffuser for a deposition chamber includes a plate having edge regions, corner regions and a center region, and plurality of gas passages comprising an orifice hole are formed between an upstream side and a downstream side of the plate, wherein one or more of a length or a diameter of the orifice holes in one or more of the corner regions or the edge regions of the plate is different than a corresponding length or a corresponding diameter of the orifice holes in the center region of the plate.
Information query
IPC分类:
