Invention Application
WO2015122979A1 GAS COOLED SUBSTRATE SUPPORT FOR STABILIZED HIGH TEMPERATURE DEPOSITION
审中-公开
气体冷却基板支撑用于稳定的高温沉积
- Patent Title: GAS COOLED SUBSTRATE SUPPORT FOR STABILIZED HIGH TEMPERATURE DEPOSITION
- Patent Title (中): 气体冷却基板支撑用于稳定的高温沉积
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Application No.: PCT/US2015/011203Application Date: 2015-01-13
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Publication No.: WO2015122979A1Publication Date: 2015-08-20
- Inventor: WEST, Brian , COX, Michael, S. , OH, Jeonghoon
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: 3050 Bowers Avenue Santa Clara, CA 95054 US
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, CA 95054 US
- Agency: PATTERSON, B., Todd et al.
- Priority: US61/940,215 20140214; US61/943,595 20140224
- Main IPC: H01L21/203
- IPC: H01L21/203 ; H01L21/683 ; H01L21/02
Abstract:
Embodiments of the present disclosure provides apparatus and method for stabilizing substrate temperature by flowing a flow of cooling gas to an inlet of cooling channels in a substrate support, receiving the flow of cooling gas from an outlet of the cooling channel using a heat exchanger, and releasing the cooling gas to an immediate environment, such as a cleanroom or a minienvironment.
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