Invention Application
- Patent Title: APPARATUS AND METHOD FOR PROCESSING SPUTTERED IC UNITS
- Patent Title (中): 用于处理溅射IC单元的装置和方法
-
Application No.: PCT/SG2015/050257Application Date: 2015-08-12
-
Publication No.: WO2016024917A1Publication Date: 2016-02-18
- Inventor: LIM, Chong Chen, Gary , BAEK, Seung Ho, James , JUNG, Jong Jae , SHIN, Yun Suk , JANG, Deok Chun
- Applicant: ROKKO SYSTEMS PTE LTD
- Applicant Address: 61 Kaki Bukit Road 2, Singapore 417869 SG
- Assignee: ROKKO SYSTEMS PTE LTD
- Current Assignee: ROKKO SYSTEMS PTE LTD
- Current Assignee Address: 61 Kaki Bukit Road 2, Singapore 417869 SG
- Agency: ENGLISH, Matthew
- Priority: SG10201404879U 20140813
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/56 ; H01L23/00
Abstract:
A method for preparing a film carrier for sputtering of IC units placed thereon, the method comprising the steps of: providing a carrier of IC units; removing said units from the carrier; delivering said IC units to a flipper; inverting and delivering said units to a sputtering film frame; placing the units on said sputtering film frame in an array having a pre-determined clearance about adjacent units.
Information query
IPC分类: