Invention Application
WO2016024917A1 APPARATUS AND METHOD FOR PROCESSING SPUTTERED IC UNITS 审中-公开
用于处理溅射IC单元的装置和方法

APPARATUS AND METHOD FOR PROCESSING SPUTTERED IC UNITS
Abstract:
A method for preparing a film carrier for sputtering of IC units placed thereon, the method comprising the steps of: providing a carrier of IC units; removing said units from the carrier; delivering said IC units to a flipper; inverting and delivering said units to a sputtering film frame; placing the units on said sputtering film frame in an array having a pre-determined clearance about adjacent units.
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