Invention Application
- Patent Title: DEPOSITION PROCESS
- Patent Title (中): 沉积过程
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Application No.: PCT/GB2016/050318Application Date: 2016-02-10
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Publication No.: WO2016132100A1Publication Date: 2016-08-25
- Inventor: RAISBECK, Deborah , HURST, Simon James , PARKIN, Ivan P. , CARMALT, Claire J. , MANZI, Joe, A.
- Applicant: PILKINGTON GROUP LIMITED , UNIVERSITY COLLEGE LONDON
- Applicant Address: European Technical Centre, Hall Lane, Lathom Ormskirk Lancashire L40 5UF GB
- Assignee: PILKINGTON GROUP LIMITED,UNIVERSITY COLLEGE LONDON
- Current Assignee: PILKINGTON GROUP LIMITED,UNIVERSITY COLLEGE LONDON
- Current Assignee Address: European Technical Centre, Hall Lane, Lathom Ormskirk Lancashire L40 5UF GB
- Agency: KNOWLES, James
- Priority: GB1502574.5 20150216
- Main IPC: C03C17/245
- IPC: C03C17/245 ; C23C16/40 ; C23C16/448 ; C23C14/18
Abstract:
A process for depositing an inorganic material on a substrate, the process comprising, providing a substrate having a surface, providing a precursor mixture comprising a metal sulfonate, and delivering the precursor mixture to the surface of the substrate, wherein the surface of the substrate is at a substrate temperature of above 450 °C and is sufficient to effect decomposition of the metal sulfonate. The inorganic material may include a metal or a metal oxide. The preferred metal sulfonate is metal triflate.
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