Invention Application
- Patent Title: CONFIGURABLE HIGH TEMPERATURE CHUCK FOR USE IN A SEMICONDUCTOR WAFER PROCESSING SYSTEM
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Application No.: PCT/US2018/028901Application Date: 2018-04-23
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Publication No.: WO2018200394A1Publication Date: 2018-11-01
- Inventor: BREINGAN, William, Gilbert , HOFMEISTER, Chris , TADDEI, John
- Applicant: VEECO PRECISION SURFACE PROCESSING LLC
- Applicant Address: 185 Gibraltar Road Horsham, PA 19044 US
- Assignee: VEECO PRECISION SURFACE PROCESSING LLC
- Current Assignee: VEECO PRECISION SURFACE PROCESSING LLC
- Current Assignee Address: 185 Gibraltar Road Horsham, PA 19044 US
- Agency: ELLIS, Edward, J. et al.
- Priority: US62/489,793 20170425
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/673 ; H01L21/683 ; H01L21/687 ; B05C13/02 ; C23C14/50
Abstract:
A reconfigurable wafer spin chuck for supporting a wafer includes a rotatable chuck base having a first opening formed therein and including one or more support members extending upwardly therefrom. The spin chuck is reconfigurable between a first chuck type and a second chuck type, wherein the first chuck type comprises a non-contact wafer type chuck and the second chuck type comprises an open backside frame type chuck. In the non- contact wafer type chuck, a first insert is mounted to the chuck base and supported by the one or more support members and in the open backside frame type chuck, a second insert is mounted to the chuck base and supported by the one or more support members. The wafer is spaced a first distance from the first insert and is spaced a second distance from the second insert, the second distance being greater than the first distance.
Information query
IPC分类: