Invention Application
- Patent Title: SHEATH AND TEMPERATURE CONTROL OF A PROCESS KIT IN A SUBSTRATE PROCESSING CHAMBER
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Application No.: PCT/US2021/022647Application Date: 2021-03-17
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Publication No.: WO2021188605A1Publication Date: 2021-09-23
- Inventor: CHO, Jaeyong , DHINDSA, Rajinder , ROGERS, James , HUSAIN, Anwar
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: 3050 Bowers Avenue
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: 3050 Bowers Avenue
- Agency: PATEL, Ronak A. et al.
- Priority: US16/853,600 2020-04-20
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/687 ; H01L21/67 ; H01J37/32 ; H02N13/00
Abstract:
Embodiments of substrate supports are provided herein. In some embodiments, a substrate support for use in a substrate processing chamber includes a ceramic plate having a first side configured to support a substrate and a second side opposite the first side, wherein the ceramic plate includes an electrode embedded in the ceramic plate; a ceramic ring disposed about the ceramic plate and having a first side and a second side opposite the first side, wherein the ceramic ring includes a chucking electrode and a heating element embedded in the ceramic ring; and a cooling plate coupled to the second side of the ceramic plate and the second side of the ceramic ring, wherein the cooling plate includes a radially inner portion, a radially outer portion, and a thermal break disposed therebetween.
Information query
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