A deposition chamber system includes a reactor interface, a flow guide attached to the reactor interface, a reactor frame disposed underneath the reactor interface to secure a substrate, and an elastic object having a first end corresponding to a base attached to the reactor interface and a second end corresponding to a compressive body disposed above the reactor frame to form a process gas containment seal between the reactor interface and the reactor frame with a compressive force. The flow guide is one of an upstream flow guide to guide a process gas flow into a reactor for performing a deposition process with respect to a substrate loaded in the reactor, or a downstream flow guide to guide residual process gases out of the reactor after performing the deposition process.