公开(公告)号：EP0900412A1

公开(公告)日：1999-03-10

申请号：EP98903239.0

申请日：1998-02-27

申请人： Koninklijke Philips Electronics N.V. ,  ASM LITHOGRAPHY B.V.

发明人： LOOPSTRA, Erik, Roelof ,  BONNEMA, Gerrit, Maarten ,  VAN DER SCHOOT, Harmen, Klaas ,  VELDHUIS, Gerjan, Peter ,  KWAN, Yim, Bun, Patrick

IPC分类号： H01L21 ,  B23Q1 ,  B23Q11 ,  G01B21 ,  G03F7 ,  G12B5

CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/709 ,  H01L21/682

摘要： A positioning device (3) suitable for use in a lithographic device with an exposure position and a characterization position has a displacement system (35) comprising a first displacement unit (39) and a second displacement unit (41) to which object holders (21, 23) can be coupled alternately. The first displacement unit is suitable for carrying out a first series of positioning steps of a first object holder (21) in a first position and for displacing the first object holder from the first position into an intermediate position (M', M'') between the first position and a second position. The second displacement unit is suitable for carrying out a second series of positioning steps of a second object holder (23) in the second position simultaneously with an independently from the first displacement unit and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position.

公开(公告)号：EP0963572A1

公开(公告)日：1999-12-15

申请号：EP98946687.0

申请日：1998-10-22

申请人： ASM LITHOGRAPHY B.V.

发明人： SPERLING, Frank, Bernard ,  LOOPSTRA, Erik, Roelof ,  PEIJNENBURG, Antonius, Theodorus, Adrianus

IPC分类号： G03F7 ,  G03F9 ,  H01L21

CPC分类号： G03F7/70716 ,  Y10T74/20341

摘要： The positioning device (3) has a first part displaceable relative to a second part having an object table (5). The second part is displaceable relative to the first part about X,Y and Z axes by three motors (75,77,79) each having an electrical coil system (81,83,85) cooperating with a permanent magnet system. The main axis of each of the motors encloses an angle of 120[deg] with the main axis of each of the other two motors. In this manner the points of application on the second part of the driving forces of the motors are uniformly distributed relative to the second part, so that driving forces can be uniformly transmitted to the object table by a simple, light stiffening structure of the second part.

摘要翻译： 所述定位装置（3）具有第一部分可移动的相对于具有到对象表的第二部分（5）。 第二部分是相对于由三个电机（75,77,79），每个具有在电线圈系统（81,83,85）与一个永久磁铁系统合作绕X，Y和Z轴的第一部分可移动的，主轴线 的每个马达的包围在与每个其它两个马达的主轴线的120°]的角度。 以这种方式对马达的驱动力的第二部分应用的点被相对均匀地分布在第二部分中，所以没驱动力可以被均匀地反式通过所述第二部分的一个简单的，重量轻的加强结构mitted到物体表 ，

公开(公告)号：EP0956518A1

公开(公告)日：1999-11-17

申请号：EP98963523.0

申请日：1998-11-27

申请人： ASM LITHOGRAPHY B.V.

发明人： LOOPSTRA, Erik, Roelof ,  STRAAIJER, Alexander

IPC分类号： G01B9 ,  G03F7 ,  H01L21

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： The system has several X and Y measuring axes cooperating with X and Y measuring mirror on object (WH). The system has one Z measuring axis (MAX7 and 8) extending partly in an XY plane and cooperating with Z measuring mirrors (R'3 and 4) on object, and Z reflectors (164 and 168). Using this simple mechanism a larger number of more accurate and reliable measurements are performed with the system.

摘要翻译： 该系统具有多个X和Y测量轴，与对象（WH）上的X和Y测量镜配合。 该系统有一个部分在XY平面上延伸的Z测量轴（MAX7和8），并与物体上的Z测量镜（R'3和4）以及Z反射器（164和168）配合使用。 使用这种简单的机制，使用系统执行更多的更准确和可靠的测量。

公开(公告)号：EP0772800B1

公开(公告)日：2000-05-10

申请号：EP96903180.6

申请日：1996-03-11

申请人： ASM LITHOGRAPHY B.V.

发明人： LOOPSTRA, Erik, Roelof ,  SPERLING, Frank, Bernhard ,  MEIJER, Hendricus, Johannes, Maria ,  VAN EIJK, Jan

IPC分类号： G03F9/00 ,  G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70833

公开(公告)号：EP0961954A1

公开(公告)日：1999-12-08

申请号：EP98965251.0

申请日：1998-12-11

申请人： ASM LITHOGRAPHY B.V.

发明人： LOOPSTRA, Erik, Roelof

IPC分类号： G03F7 ,  G03F9 ,  H01L21

CPC分类号： G03F9/7026 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/7075 ,  G03F7/70775 ,  G03F9/7003

摘要： In a lithographic projection apparatus, a time-saving height measurement method is used. While in a projection station (105, 108, 111) the pattern of a mask (129) is projected on the fields of a first substrate (120), the height of the fields of a second substrate (121) is measured in a measuring station (133). In the measuring station, the height of the substrate fields and the height of the substrate holder (113) are measured by a first height sensor (150) and a second height sensor (160), respectively, and the value of the height of the substrate holder associated with the ideal height of the substrate field is determined for each substrate field. In the projection station, only the height of the substrate holder (111) is controlled by a third height sensor (180). The second and third height sensors are preferably part of a composite XY interferometer system extended with a Z measuring axis.