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公开(公告)号：EP0068488B1
公开(公告)日：1985-06-12
申请号：EP82105737.9
申请日：1982-06-28
CPC分类号： G03F7/039 , Y10T428/24306
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公开(公告)号：EP0068488A1
公开(公告)日：1983-01-05
申请号：EP82105737.9
申请日：1982-06-28
CPC分类号： G03F7/039 , Y10T428/24306
摘要： A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.
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公开(公告)号：EP0090089A3
公开(公告)日：1984-05-23
申请号：EP82111725
申请日：1982-12-17
发明人： Fujii, Tsuneo , Inukai, Hiroshi , Deguchi, Takayuki , Amano, Toshihiko , Kakuchi, Masami , Asakawa, Hiroshi , Kogure, Osamu
IPC分类号： G03F07/10
CPC分类号： G03F7/039 , Y10T428/24802 , Y10T428/24826
摘要： A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula:
wherein R, is methyl group, ethyl group, a halogensub- stituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an a-cyanoacrylate.-
公开(公告)号：EP0090089B1
公开(公告)日：1988-10-05
申请号：EP82111725.6
申请日：1982-12-17
发明人： Fujii, Tsuneo , Inukai, Hiroshi , Deguchi, Takayuki , Amano, Toshihiko , Kakuchi, Masami , Asakawa, Hiroshi , Kogure, Osamu
IPC分类号： G03F7/10
CPC分类号： G03F7/039 , Y10T428/24802 , Y10T428/24826
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公开(公告)号：EP0090089A2
公开(公告)日：1983-10-05
申请号：EP82111725.6
申请日：1982-12-17
发明人： Fujii, Tsuneo , Inukai, Hiroshi , Deguchi, Takayuki , Amano, Toshihiko , Kakuchi, Masami , Asakawa, Hiroshi , Kogure, Osamu
IPC分类号： G03F7/10
CPC分类号： G03F7/039 , Y10T428/24802 , Y10T428/24826
摘要： A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula:
wherein R, is methyl group, ethyl group, a halogensub- stituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an a-cyanoacrylate.
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