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公开(公告)号：EP0090089A3
公开(公告)日：1984-05-23
申请号：EP82111725
申请日：1982-12-17
发明人： Fujii, Tsuneo , Inukai, Hiroshi , Deguchi, Takayuki , Amano, Toshihiko , Kakuchi, Masami , Asakawa, Hiroshi , Kogure, Osamu
IPC分类号： G03F07/10
CPC分类号： G03F7/039 , Y10T428/24802 , Y10T428/24826
摘要： A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula:
wherein R, is methyl group, ethyl group, a halogensub- stituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an a-cyanoacrylate.-
公开(公告)号：EP0068488B1
公开(公告)日：1985-06-12
申请号：EP82105737.9
申请日：1982-06-28
CPC分类号： G03F7/039 , Y10T428/24306
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公开(公告)号：EP0068488A1
公开(公告)日：1983-01-05
申请号：EP82105737.9
申请日：1982-06-28
CPC分类号： G03F7/039 , Y10T428/24306
摘要： A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.
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4.发明授权Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film 失效形成氟基丙烯酸酯聚合物在基材上的方法和从电影制备图案的方法
公开(公告)号：EP0049884B1
公开(公告)日：1986-01-15
申请号：EP81108158.7
申请日：1981-10-10
发明人： Hattori, Shuzo , Morita, Shinzo , Fujii, Tsuneo
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5.发明公开Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film 失效一种用于在衬底和用于从电影产生的抗蚀剂图像的方法上产生Fluoralkylacrylatpolymerfilmes方法。
公开(公告)号：EP0049884A1
公开(公告)日：1982-04-21
申请号：EP81108158.7
申请日：1981-10-10
发明人： Hattori, Shuzo , Morita, Shinzo , Fujii, Tsuneo
摘要： A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment. The pattern formation by electron beam delineation is promoted by heat treating the delineated film at a temperature not less than the glass transition temperature of the polymer under reduced pressure or by treating the delineated film with hydrogen or an inert gas plasma.
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公开(公告)号：EP0090089B1
公开(公告)日：1988-10-05
申请号：EP82111725.6
申请日：1982-12-17
发明人： Fujii, Tsuneo , Inukai, Hiroshi , Deguchi, Takayuki , Amano, Toshihiko , Kakuchi, Masami , Asakawa, Hiroshi , Kogure, Osamu
IPC分类号： G03F7/10
CPC分类号： G03F7/039 , Y10T428/24802 , Y10T428/24826
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公开(公告)号：EP0090089A2
公开(公告)日：1983-10-05
申请号：EP82111725.6
申请日：1982-12-17
发明人： Fujii, Tsuneo , Inukai, Hiroshi , Deguchi, Takayuki , Amano, Toshihiko , Kakuchi, Masami , Asakawa, Hiroshi , Kogure, Osamu
IPC分类号： G03F7/10
CPC分类号： G03F7/039 , Y10T428/24802 , Y10T428/24826
摘要： A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula:
wherein R, is methyl group, ethyl group, a halogensub- stituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an a-cyanoacrylate.
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