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    Lithographic device with a suspended object table
    3.
    发明公开
    Lithographic device with a suspended object table 失效
    石油勘探开发公司（Objekttisch）。

    公开(公告)号：EP0498496A1

    公开(公告)日：1992-08-12

    申请号：EP92200253.0

    申请日：1992-01-29

    申请人： Philips Electronics N.V. ,  ASM LITHOGRAPHY B.V.

    发明人： Franken, Dominicus Jacobus ,  Jacobs, Franciscus Mathijs ,  Van Kimmenade, Johannes Mathijs Maria ,  Van Dijk, Cornelis Dionysius ,  Van Eijk, Jan

    IPC分类号： G03F7/20

    CPC分类号： F16F15/04 ,  F16F15/022 ,  F16F15/0232 ,  G03F7/70716

    摘要： A lithographic device with a lithographic irradiation system (1, 13) which is fastened near a lower side to a mounting member (5) of a frame (7). The device is provided with a unit (65) which is formed by a positioning device (37), with which an object table (21) arranged below the irradiation system (1,13) is displaceable, and by a support member (35), over which the object table (21) is guided by means of an aerostatic foot (31). In an operational position, the unit (65) is coupled to a carrier (67) by means of coupling members (73), the carrier (67) being suspended from the mounting member (5) by means of suspension elements (79, 81, 83), so that the unit (65) is arranged between lower frame supports (25) of the frame (7) and a compact construction is obtained.
    The unit (65) can be rotated from the operational position to an end position, in which the unit (65) is entirely outside the frame (7) and is easily accessible for maintainance, by means of a rotation mechanism (87) and a swivel mechanism (89).
    The lithographic device can be used inter alia for irradiating semiconductor substrates, a semiconductor pattern provided on a mask (11) being imaged on a semiconductor substrate (19) provided on the object table (21) by means of the irradiation system (1, 13).

    摘要翻译： 一种具有光刻照射系统（1,13）的平版印刷设备，其被固定在靠近框架（7）的安装构件（5）的下侧。 该装置设置有由定位装置（37）形成的单元（65），布置在照射系统（1,13）下方的物台（21）可通过该定位装置和支撑构件（35）移动， 通过空气静止脚（31）引导对象台（21）。 在操作位置，单元（65）通过联接构件（73）联接到托架（67），托架（67）借助于悬挂元件（79,81）从安装构件（5）悬挂 ，83），使得单元（65）布置在框架（7）的下框架支撑件（25）之间并获得紧凑的结构。 单元（65）可以从操作位置旋转到终端位置，其中单元（65）完全在框架（7）的外部，并且通过旋转机构（87）和 旋转机构（89）。 光刻设备可以特别用于照射半导体衬底，设置在掩模（11）上的半导体图案通过照射系统（1,13）被成像在设置在对象台（21）上的半导体衬底（19）上 ）。