公开(公告)号：EP3385685A1

公开(公告)日：2018-10-10

申请号：EP17165318.1

申请日：2017-04-06

申请人： ASML Netherlands B.V.

发明人： POLO, Alessandro ,  PANDEY, Nitesh ,  KOOLEN, Armand, Eugene, Albert

IPC分类号： G01J3/02 ,  G01J3/18 ,  G01J3/28 ,  G01J3/36 ,  G03F7/20

CPC分类号： G03F7/7065 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7088

摘要： A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.

公开(公告)号：EP3055737A1

公开(公告)日：2016-08-17

申请号：EP14766961.8

申请日：2014-09-11

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： TINNEMANS, Patricius Aloysius Jacobus ,  DEN BOEF, Arie Jeffrey ,  KREUZER, Justin Loyd ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC分类号： G03F9/00

CPC分类号： G03F9/7069 ,  G01B9/02011 ,  G01B9/02015 ,  G01B11/272 ,  G01B2290/70 ,  G03F9/7049 ,  G03F9/7088

摘要： Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.

公开(公告)号：EP2947512A2

公开(公告)日：2015-11-25

申请号：EP15001489.2

申请日：2015-05-18

申请人： Canon Kabushiki Kaisha

发明人： Ogura, Masahiro ,  Mishima, Kazuhiko ,  Mizumoto, Kazushi

IPC分类号： G03F9/00

CPC分类号： G03F7/70725 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049

摘要： A lithography apparatus which forms a pattern on a substrate, comprises a stage (14) holding the substrate and being movable; a measurement unit (4) configured to irradiate a side surface of the stage with light and measure a position of the stage, a generation unit (6) configured to generate a flow of gas in a space where the stage moves, a detection unit (15) configured to detect respective positions of sample shot regions formed on the substrate, and a control unit (16) configured to determine an order of detecting the sample shot regions by the detection unit such that detection by the detection unit is performed sequentially from a sample shot region closer to the measurement unit with respect to sample shot regions located on a downstream side of the flow of the gas from a center of the substrate.

摘要翻译： 在基板上形成图案的光刻设备包括保持基板并可移动的台（14） 测量单元（4），被配置为用光照射舞台的侧面并测量舞台的位置;生成单元（6），被配置为在舞台移动的空间中产生气体流;检测单元 15），被配置为检测形成在所述基板上的样本拍摄区域的各个位置;以及控制单元（16），被配置为确定由所述检测单元检测所述采样镜头区域的顺序，使得由所述检测单元进行的检测是从 相对于位于来自基板的中心的气体流的下游侧的样本射出区域更靠近测量单元的样品射击区域。

公开(公告)号：EP2909677A1

公开(公告)日：2015-08-26

申请号：EP13759242.4

申请日：2013-09-10

申请人： ASML Netherlands B.V.

发明人： KOK, Haico ,  VOOGD, Robbert Jan

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70775 ,  G01B11/0675 ,  G01B11/14 ,  G03F7/70483 ,  G03F7/70525 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7092

摘要： A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.

摘要翻译： 一种用于测量物理量的传感器系统，所述系统包括具有多个检测器的并行检测装置，以允许在不同空间位置处并行测量，其中所述多个检测器共享噪声源，其中所述传感器系统被配置为使得所述多个检测器 输出作为物理量的函数的信号，并且其中所述传感器系统被配置为使得至少一个检测器响应于来自所述共享噪声源的噪声不同于所述一个或多个其它检测器

公开(公告)号：EP2071613A4

公开(公告)日：2014-05-21

申请号：EP07806596

申请日：2007-09-03

申请人： NIPPON KOGAKU KK

发明人： SHIBAZAKI YUICHI

IPC分类号： G03F7/20 ,  G01B11/00 ,  G01B11/26 ,  H01L21/027

CPC分类号： G03F7/70775 ,  G01B21/042 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70975 ,  G03F9/70 ,  G03F9/7046 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/681 ,  Y10T29/49002

摘要： A controller measures positional information of a stage (WST) within an XY plane using three encoders (Enc1, Enc2 and Enc3) which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage (WST) is driven in the XY plane, based on measurement results of the positional information and positional information (p 1 , q 1 ), (p 2 , q 2 ), and (p 3 , q 3 ) in a surface parallel to the XY plane of a head (encoders) (Encl, Enc2 and Enc3) used for measurement of the positional information. Accordingly, it becomes possible to control the movement of the stage with good precision, while switching the head (the encoder) used for control during the movement of the stage (WST) using the encoder system which includes a plurality of heads.

摘要翻译： 控制器测量位置的阶段（WST）的内在使用三个编码器（ENC1，ENC2和ENC3），其中至少包括每一个X编码器和编码器系统的Y编码器中的一个，并且阶段XY平面信息（WST） 被驱动在XY平面中，基于所述位置信息和位置信息（p 1，q 1）的测量结果，（p 2，q 2）和（p 3，q 3）的平面平行的表面与XY 头（编码器）的（机箱机箱，ENC2和ENC3）用于位置信息的测量。 因此，变得可以控制具有良好的精度级的移动，同时，使用编码器系统，其包括磁头多个开关阶段（WST）的移动过程中用于控制的头（编码器）。

公开(公告)号：EP2171537B1

公开(公告)日：2012-05-02

申请号：EP08794586.1

申请日：2008-07-18

申请人： MOLECULAR IMPRINTS, INC.

发明人： NIMMAKAYALA, Pawan, K. ,  CHOI, Byung-Jin

IPC分类号： G03F7/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7049 ,  G03F9/7088

摘要： A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates.

公开(公告)号：EP2206020A2

公开(公告)日：2010-07-14

申请号：EP08803847.6

申请日：2008-09-08

申请人： International Business Machines Corporation

发明人： GRANADOS, Axel, Aguado ,  FOX, Benjamin, Aaron ,  GIBBS, Nathaniel, James ,  MAKI, Andrew, Benson ,  TIMPANE, Trevor, Joseph

IPC分类号： G03F9/00

CPC分类号： G03F9/7049 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084 ,  G03F9/7088 ,  G03F9/7096 ,  Y10S438/975

摘要： A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.

公开(公告)号：EP0634702B1

公开(公告)日：2010-01-20

申请号：EP94202942.2

申请日：1991-03-26

申请人： CANON KABUSHIKI KAISHA

发明人： Nose, Noriyuki. Canon Kabushiki Kaisha ,  Saitoh, Kenji, Canon Kabushiki Kaisha ,  Sentoku, Koichi, Canon Kabushiki Kaisha ,  Toshii, Minoru, Canon Kabushiki Kaisha

IPC分类号： G03F9/00 ,  G03F7/20

CPC分类号： G03F7/70633 ,  G03F9/7049

公开(公告)号：EP1674937A3

公开(公告)日：2009-09-30

申请号：EP05111367.8

申请日：2005-11-28

申请人： ASML Netherlands B.V.

发明人： van Bilsen, Franciscus Bernardus Maria

IPC分类号： G03F9/00

CPC分类号： G03F9/7088 ,  G03F9/7049 ,  G03F9/7069 ,  G03F9/7076

摘要： A lithographic apparatus has an actuator to move an object with a mark (M3) with a plurality of structures (19) in rows and columns. An alignment arrangement has a light source, optics and a detector. The light source and the optics produce an alignment beam with a first spot portion (24x) extending in a first direction parallel to the columns and a second spot portion (24y) extending in a second direction parallel to the rows. The optics direct the alignment beam to the mark (M3), receive alignment radiation back from the mark (M3) and transmit the alignment radiation to the detector. The detector transmits an alignment signal to a processor that calculates a two-dimensional position of the mark (M3) based on the alignment signal.

公开(公告)号：EP1400854A3

公开(公告)日：2009-07-08

申请号：EP03077974.8

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Bilsen, Franciscus Bernardus Maria ,  Burghoorn, Jacobus ,  Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Van Horssen, Hermanus Gerardus ,  Huijbregtse, Jeroen ,  Jeunink, Andre Bernardus ,  Megens, Henry ,  Navarro Y Koren, Ramon ,  Tolsma, Hoite Pieter Theodoor ,  Simons, Hubertus Johannes Gertrudus ,  Schuurhuis, Johny Rutger ,  Schets, Sicco Ian ,  Lee, Brian ,  Dunbar, Allan

IPC分类号： G03F7/20

CPC分类号： G03F9/7049 ,  G03F7/70483 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7084 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.