公开(公告)号：EP0220668A3

公开(公告)日：1989-01-11

申请号：EP86114612.4

申请日：1986-10-22

申请人： HITACHI, LTD.

发明人： Saitou, Norio ,  Okumura, Masahide ,  Komoda, Tsutomu ,  Ooyama, Mitsuo

IPC分类号： H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

摘要： A charged particle beam lithography system has a high-throughput and inexpensive system configuration. The system configuration is constituted by a plurality of charged particle optical systems (17, 18, 19) each adapted to focus and deflect a beam of charged particles and irradiate the beam onto a specimen (10) so that the beam draws a desired pattern on the specimen, a plurality of deflection distortion correcting circuits (14, 15, 16) each associated with each of the charged particle optical systems for correcting a deflection distortion of each charged particle optical system, and a common pattern data control circuit (1, 3, 4) for supplying data of a pattern to be drawn to each of the plurality of deflection distortion correcting circuits.

公开(公告)号：EP0308970A3

公开(公告)日：1990-02-14

申请号：EP88115730.9

申请日：1988-09-23

申请人： HITACHI, LTD.

发明人： Takata, Keiji ,  Hosoki, Shigeyuki ,  Hosaka, Sumio ,  Komoda, Tsutomu

IPC分类号： H01L41/08

CPC分类号： H02N2/0045 ,  H02N2/0025 ,  H02N2/003 ,  H02N2/026 ,  H02N2/028 ,  H02N2/103

摘要： A piezoelectric motor is disclosed, which comprises a slider including a tabular vibrator (1) in which a standing wave is excited, and a plurality of piezoelectric actuators (2, 3) securely mounted at the parts of the lower surface of the vibrator (1) corresponding to the loop and node of the standing wave and adapted to be deformed in phase with the standing wave.

公开(公告)号：EP0220668B1

公开(公告)日：1992-03-11

申请号：EP86114612.4

申请日：1986-10-22

申请人： HITACHI, LTD.

发明人： Saitou, Norio ,  Okumura, Masahide ,  Komoda, Tsutomu ,  Ooyama, Mitsuo

IPC分类号： H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

公开(公告)号：EP0220668A2

公开(公告)日：1987-05-06

申请号：EP86114612.4

申请日：1986-10-22

申请人： HITACHI, LTD.

发明人： Saitou, Norio ,  Okumura, Masahide ,  Komoda, Tsutomu ,  Ooyama, Mitsuo

IPC分类号： H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

摘要： A charged particle beam lithography system has a high-throughput and inexpensive system configuration. The system configuration is constituted by a plurality of charged particle optical systems (17, 18, 19) each adapted to focus and deflect a beam of charged particles and irradiate the beam onto a specimen (10) so that the beam draws a desired pattern on the specimen, a plurality of deflection distortion correcting circuits (14, 15, 16) each associated with each of the charged particle optical systems for correcting a deflection distortion of each charged particle optical system, and a common pattern data control circuit (1, 3, 4) for supplying data of a pattern to be drawn to each of the plurality of deflection distortion correcting circuits.