公开(公告)号：EP0033138A1

公开(公告)日：1981-08-05

申请号：EP81100462.1

申请日：1981-01-22

申请人： Hitachi, Ltd.

发明人： Saitou, Norio ,  Ozasa, Susumu ,  Kuroda, Katsuhiro

IPC分类号： H01L21/42

CPC分类号： H01J37/304

摘要： In a method for correcting deflection distortions which develop in an apparatus for delineating a pattern on a sample by scanning a charged particle beam (5), this invention makes the corrections of the deflection distortions in accordance with a height (deformation) of a portion to-be-delineated on the sample (for example, wafer) on the basis of correction magnitudes of the deflection distortions at respective reference levels of a mark as obtained by scanning the charged particle beam (5) on the mark which has at least two reference levels (10, 11) having unequal heights in a direction of the optical axis.

公开(公告)号：EP0263517B1

公开(公告)日：1993-08-04

申请号：EP87114694.0

申请日：1987-10-08

申请人： HITACHI, LTD.

发明人： Ooyama, Mitsuo ,  Ando, Kimiaki ,  Kawamura, Yoshio ,  Saitou, Norio ,  Simura, Takanori ,  Kohida, Hiroyuki

IPC分类号： H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/31762

公开(公告)号：EP0263517A3

公开(公告)日：1989-09-06

申请号：EP87114694.0

申请日：1987-10-08

申请人： HITACHI, LTD.

发明人： Ooyama, Mitsuo ,  Ando, Kimiaki ,  Kawamura, Yoshio ,  Saitou, Norio ,  Simura, Takanori ,  Kohida, Hiroyuki

IPC分类号： H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/31762

摘要： There is disclosed a lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, comprising a framing pattern memory (4) for storing therein framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator (3) for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for drawing (5) for scanning said framing pattern memory having the framing lines of the pattern to be drawn written therein and for generating a beam deflection address for drawing (207, 208) and a beam blanking control signal (211).

摘要翻译： 公开了一种光刻设备，其中控制诸如电子束或离子束的带电粒子射线以扫描样品的期望区域并由此绘制图案，该图案设备包括用于在其中存储成帧线的成帧图案存储器（4） 以点图像的形式绘制的图案的图案生成器（3），用于将要被绘制的图案的框线以点图像的形式写入到所述框图案存储器中的成帧图案生成器（3），以及用于绘制的光栅扫描电路 （5），用于扫描具有要写入其中的图案的框线的所述成帧图案存储器，并用于产生用于绘制（207,208）的光束偏转地址和光束消隐控制信号（211）。

公开(公告)号：EP0220668A3

公开(公告)日：1989-01-11

申请号：EP86114612.4

申请日：1986-10-22

申请人： HITACHI, LTD.

发明人： Saitou, Norio ,  Okumura, Masahide ,  Komoda, Tsutomu ,  Ooyama, Mitsuo

IPC分类号： H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

摘要： A charged particle beam lithography system has a high-throughput and inexpensive system configuration. The system configuration is constituted by a plurality of charged particle optical systems (17, 18, 19) each adapted to focus and deflect a beam of charged particles and irradiate the beam onto a specimen (10) so that the beam draws a desired pattern on the specimen, a plurality of deflection distortion correcting circuits (14, 15, 16) each associated with each of the charged particle optical systems for correcting a deflection distortion of each charged particle optical system, and a common pattern data control circuit (1, 3, 4) for supplying data of a pattern to be drawn to each of the plurality of deflection distortion correcting circuits.

公开(公告)号：EP0066883A3

公开(公告)日：1985-05-15

申请号：EP82105024

申请日：1982-06-08

申请人： Hitachi, Ltd. ,  Nippon Telegraph and Telephone Public Corporation

发明人： Matsuda, Tadahito ,  Okubo, Tsuneo ,  Ozasa, Susumu ,  Saitou, Norio ,  Yoda, Haruo

IPC分类号： H01L21/00

CPC分类号： H01L23/544 ,  H01J37/3045 ,  H01L21/0277 ,  H01L21/30 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： An exposure method with an electron beam exposure apparatus in which an electron beam is emitted onto a substrate (1) such as a silicon wafer on which an electron-beam sensitive resist is coated, thereby directly forming or writing patterns. A substrate (1) having thereon a number of chips (2) are divided into blocks (3), marks (4) are provided on each of the blocks (3), the positions of the marks (4) are detected and the writing exposure positions of the chips (2) within each block (3) are modified on the basis of the detection results. According to this invention, efficient writing exposure can be made with high accuracy.

公开(公告)号：EP0220668B1

公开(公告)日：1992-03-11

申请号：EP86114612.4

申请日：1986-10-22

申请人： HITACHI, LTD.

发明人： Saitou, Norio ,  Okumura, Masahide ,  Komoda, Tsutomu ,  Ooyama, Mitsuo

IPC分类号： H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

公开(公告)号：EP0066883B1

公开(公告)日：1989-09-20

申请号：EP82105024.2

申请日：1982-06-08

申请人： Hitachi, Ltd. ,  NIPPON TELEGRAPH AND TELEPHONE CORPORATION

发明人： Matsuda, Tadahito ,  Okubo, Tsuneo ,  Ozasa, Susumu ,  Saitou, Norio ,  Yoda, Haruo

IPC分类号： H01L21/00

CPC分类号： H01L23/544 ,  H01J37/3045 ,  H01L21/0277 ,  H01L21/30 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

公开(公告)号：EP0220668A2

公开(公告)日：1987-05-06

申请号：EP86114612.4

申请日：1986-10-22

申请人： HITACHI, LTD.

发明人： Saitou, Norio ,  Okumura, Masahide ,  Komoda, Tsutomu ,  Ooyama, Mitsuo

IPC分类号： H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

摘要： A charged particle beam lithography system has a high-throughput and inexpensive system configuration. The system configuration is constituted by a plurality of charged particle optical systems (17, 18, 19) each adapted to focus and deflect a beam of charged particles and irradiate the beam onto a specimen (10) so that the beam draws a desired pattern on the specimen, a plurality of deflection distortion correcting circuits (14, 15, 16) each associated with each of the charged particle optical systems for correcting a deflection distortion of each charged particle optical system, and a common pattern data control circuit (1, 3, 4) for supplying data of a pattern to be drawn to each of the plurality of deflection distortion correcting circuits.

公开(公告)号：EP0033138B1

公开(公告)日：1984-04-18

申请号：EP81100462.1

申请日：1981-01-22

申请人： Hitachi, Ltd.

发明人： Saitou, Norio ,  Ozasa, Susumu ,  Kuroda, Katsuhiro

IPC分类号： H01L21/42

CPC分类号： H01J37/304

公开(公告)号：EP0263517A2

公开(公告)日：1988-04-13

申请号：EP87114694.0

申请日：1987-10-08

申请人： HITACHI, LTD.

发明人： Ooyama, Mitsuo ,  Ando, Kimiaki ,  Kawamura, Yoshio ,  Saitou, Norio ,  Simura, Takanori ,  Kohida, Hiroyuki

IPC分类号： H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/31762

摘要： There is disclosed a lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, comprising a framing pattern memory (4) for storing therein framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator (3) for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for drawing (5) for scanning said framing pattern memory having the framing lines of the pattern to be drawn written therein and for generating a beam deflection address for drawing (207, 208) and a beam blanking control signal (211).

摘要翻译： 公开了一种光刻设备，其中控制诸如电子束或离子束的带电粒子扫描样品的期望区域，从而绘制图案，其包括用于存储框架线的框架图案存储器（4） 以点图像的形式绘制的图案的框图案生成器（3），用于以点图像的形式将待绘制的图案的成帧线写入所述成帧图案存储器;以及用于绘制的光栅扫描电路 （5），用于扫描具有要绘制的图案的成帧线的所述成帧图案存储器，并产生用于绘制的光束偏转地址（207,208）和光束消隐控制信号（211）。